A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interf...A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interferometers. A static positioning error measuring method has been used to examine the precision and repeatability of the laser interferometer. An optical resolution of 1.24 nm and an accuracy of nanometer scale have been achieved.展开更多
基金This work was supported by the Optical Science &Technology Project of Shanghai Municipal Science andTechnology Commission under Grant No. 022261052.
文摘A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interferometers. A static positioning error measuring method has been used to examine the precision and repeatability of the laser interferometer. An optical resolution of 1.24 nm and an accuracy of nanometer scale have been achieved.
