Thin tungsten nitride (WNx) films were produced by reactive DC magnetron sputtering of tungsten in an Ar-N2 gas mixture. The films were used as Schottky contacts on AlGaN/GaN heterostructures. The Schottky behaviours ...Thin tungsten nitride (WNx) films were produced by reactive DC magnetron sputtering of tungsten in an Ar-N2 gas mixture. The films were used as Schottky contacts on AlGaN/GaN heterostructures. The Schottky behaviours of WNx contact was investigated under various annealing conditions by current-voltage (I-V ) measurements. The results show that the gate leakage current was reduced to 10-6 A/cm2 when the N2 flow is 400 mL/min. The results also show that the WNx contact improved the thermal stability of Schottky contacts. Finally, the current transport mechanism in WNx/AlGaN/GaN Schottky diodes has been investigated by means of I-V characterisation technique at various temperatures between 300 K and 523 K. A TE model with a Gaussian distribution of Schottky barrier heights (SBHs) is thought to be responsible for the electrical behaviour at temperatures lower than 523 K.展开更多
基金Supported by the National Basic Research Programme of China under Grant No 2007CB307004, the National Nature Science Foundation of China under Grant Nos 60276034, 60577030 and 60607003, and the National High-Technology Programme of China under Grant No 2006AA03Al13.
基金Supported by the National Natural Science Foundation of China under Grant Nos 61006035, 61076012, 60676032 and 60607003, the National Key Basic Research Program of China under Grant No TG-2007CB307004, the National High-Tech Research and Development Program of China under Grant No 2009AA03A198, and the Postdoctoral Science Foundation of China under Grant No 20090460168
基金Supported by the National High Technology Research and Development Programme of China under Grant No 2005AA31G020, the National Basic Research Programme of China under Grant Nos 2002CB613505 and 2007CB307004, and the National Natural Science Foundation of China under Grant Nos 60477011, 60577030, and 60607003.
文摘Thin tungsten nitride (WNx) films were produced by reactive DC magnetron sputtering of tungsten in an Ar-N2 gas mixture. The films were used as Schottky contacts on AlGaN/GaN heterostructures. The Schottky behaviours of WNx contact was investigated under various annealing conditions by current-voltage (I-V ) measurements. The results show that the gate leakage current was reduced to 10-6 A/cm2 when the N2 flow is 400 mL/min. The results also show that the WNx contact improved the thermal stability of Schottky contacts. Finally, the current transport mechanism in WNx/AlGaN/GaN Schottky diodes has been investigated by means of I-V characterisation technique at various temperatures between 300 K and 523 K. A TE model with a Gaussian distribution of Schottky barrier heights (SBHs) is thought to be responsible for the electrical behaviour at temperatures lower than 523 K.
基金国家自然科学基金(批准号:60676032,60276010,60376025,60276034)和北京市科技计划(批准号:H030430020230)资助项目 Project supported by the National Natural Science Foundation of China(Nos. 60676032,60276010,60376025,60276034) and the Beijing Scientific & Technical Program(No.H030130020230)
