Improving the surface insulation of epoxy resin by plasma etching

Epoxy resin(EP)tends to accumulate a large amount of charge on its surface when exposed to a high-voltage DC electric field,which leads to a reduction in its insulative performance and an increase in potential safety risks in power systems.To suppress charge accumulation,improve the flashover voltage of the EP,and reduce the risk of gas insulated switchgear(GIS)/gas insulated transmission line(GIL)failure,we used two plasma-etching methods,i.e.,atmospheric-pressure dielectric barrier discharge(DBD)and the atmospheric-pressure plasma jet(APPJ),to modify the surface of the EP.The surface morphology and electrical properties of the modified materials were explored as a function of time.The results show that after DBD treatment,the roughness of the sample increases by 103.9 nm,the conductivity increases by3.9×10^(-18)S,and the flashover voltage increases by 14.4%;after APPJ treatment,the roughness of the sample increases by 223.5 nm,the conductivity increases by 3.4×10^(-17)S,and the flashover voltage increases by 18%.This shows that both plasma-etching methods can improve the insulation properties of materials by improving the surface-charge characteristics.The two methods are compared with each other:the APPJ treatment method is better at improving the surface roughness and electrical properties of materials,and this flexible treatment method has greater potential in industrial applications.

Effect of plasma step gradient modification on surface electrical properties of epoxy resin

In this paper,plasma fluorination is combined with plasma silicon deposition to achieve step gradient modification on an epoxy resin surface.The physicochemical characteristics of samples are investigated and the electrical performances measured.The obtained results show that compared with untreated and single treated samples,the samples treated by step gradient modification significantly improve the flashover performance.According to experiment and simulation,the mechanism explanations are summarized as follows.First,it is found that the step gradient conductivity can effectively optimize the electric field distribution of a needle-needle electrode.Then,step gradient modification suppresses the accumulation of surface charge at the triple junction and makes the charge distribution more uniform.Furthermore,it can accelerate the surface dissipation on a high electrical field region and control the dissipation rate on a low electrical field region.All these results can restrain surface discharge and increase the flashover voltage.The step gradient modification method proposed in this paper provides a new idea for improving the surface insulation performance.

Improving the surface flashover performance of epoxy resin by plasma treatment:a comparison of fluorination and silicon deposition under different modes

This work treats the Al_(2)O_(3)-ER sample surface using dielectric barrier discharge fluorination(DBDF),DBD silicon deposition(DBD-Si),atmospheric-pressure plasma jet fluorination(APPJ-F)and APPJ silicon deposition(APPJ-Si).By comparing the surface morphology,chemical components and electrical parameters,the diverse mechanisms of different plasma modification methods used to improve flashover performance are revealed.The results show that the flashover voltage of the DBDF samples is the largest(increased by 21.2%at most),while the APPJ-F method has the worst promotion effect.The flashover voltage of the APPJ-Si samples decreases sharply when treatment time exceeds 180 s,but the promotion effect outperforms the DBD-Si method during a short modified time.For the mechanism explanation,firstly,plasma fluorination improves the surface roughness and introduces shallow traps by etching the surface and grafting fluorine-containing groups,while plasma silicon deposition reduces the surface roughness and introduces a large number of shallow traps by coating Si Oxfilm.Furthermore,the reaction of the DBD method is more violent,while the homogeneity of the APPJ modification is better.These characteristics influence the effects of fluorination and silicon deposition.Finally,increasing the surface roughness and introducing shallow traps accelerates surface charge dissipation and inhibits flashover,but too many shallow traps greatly increase the dissipated rate and facilitate surface flashover instead.