Electrical properties of In_x Al_(1-x)N/AlN/GaN structure are investigated by solving coupled Schr(o|¨)dinger and Poisson equations self-consistently.The variations in internal polarizations in In_xAl_(1-x...Electrical properties of In_x Al_(1-x)N/AlN/GaN structure are investigated by solving coupled Schr(o|¨)dinger and Poisson equations self-consistently.The variations in internal polarizations in In_xAl_(1-x)N with indium contents are studied and the total polarization is zero when the indium content is 0.41.Our calculations show that the twodimensional electron gas(2DEG) sheet density will decrease with increasing indium content.There is a critical thickness for AIN.The 2DEG sheet density will increase with In_xAl_(1-x)N thickness when the AIN thickness is less than the critical value.However,once the AIN thickness becomes greater than the critical value,the 2DEG sheet density will decrease with increasing barrier thickness.The critical value of AIN is 2.8 nm for the lattice-matched In_(0.18)Al_(0.82)N/AlN/GaN structure.Our calculations also show that the critical value decreases with increasing indium content.展开更多
文摘介绍了一种基于氮化镓高电子迁移率晶体管(GaN HEMTs)的S波段大功率固态功放组件,详细阐述了组件的微波链路设计、热设计、BITE设计以及电源设计等设计中的关键性问题。测试结果表明,组件在450μs脉宽、15%占空比条件下输出峰值功率不小于1. 6 k W,效率达到40%。组件创新性地采用实时参数化的数字采样技术、激励/控制输入通道的冗余设计技术,适应高可靠雷达系统的健康管理对组件的智能化要求。
基金Project supported by the Knowledge Innovation Engineering of the Chinese Academy of Sciences(No.YYYJ-0701-02)the National Natural Science Foundation of China(Nos.60890193,60906006)+1 种基金the State Key Development Program for Basic Research of China(Nos. 2006CB604905,2010CB327503)the Knowledge Innovation Program of the Chinese Academy of Sciences(Nos.ISCAS2008T01, ISCAS2009L01,ISCAS2009L02)
文摘Electrical properties of In_x Al_(1-x)N/AlN/GaN structure are investigated by solving coupled Schr(o|¨)dinger and Poisson equations self-consistently.The variations in internal polarizations in In_xAl_(1-x)N with indium contents are studied and the total polarization is zero when the indium content is 0.41.Our calculations show that the twodimensional electron gas(2DEG) sheet density will decrease with increasing indium content.There is a critical thickness for AIN.The 2DEG sheet density will increase with In_xAl_(1-x)N thickness when the AIN thickness is less than the critical value.However,once the AIN thickness becomes greater than the critical value,the 2DEG sheet density will decrease with increasing barrier thickness.The critical value of AIN is 2.8 nm for the lattice-matched In_(0.18)Al_(0.82)N/AlN/GaN structure.Our calculations also show that the critical value decreases with increasing indium content.