Effect of C：F deposition on SiCOH etching in a CHF3 dual-frequency capacitively couple plasma, driven by a high-frequency source of 60 MHz （HF） and a low-frequency source of 2 MHz （LF） simultaneously, is investig...Effect of C：F deposition on SiCOH etching in a CHF3 dual-frequency capacitively couple plasma, driven by a high-frequency source of 60 MHz （HF） and a low-frequency source of 2 MHz （LF） simultaneously, is investigated. With the increase in LF power, the change of C：F layer from dense C：F layer to porous C：F layer and further to C：F filling gaps was observed, which led to the transition from films deposition to films etching. The change of C：F layer is related to the bombardment by energetic ions and CF2 concentration in the plasma. As the LF power increased to 35 - 40 W, the energetic ions and the low CF2 concentration led to a suppression of C：F deposition. Therefore, the SiCOH films can be etched at higher LF power.展开更多
Effect of low-frequency power on F, CF2 relative density and F/CF2 ratio, in C2F6, C4F8 and CHF3 dual-frequency capacitively couple discharge driven by the power of 13.56 MHz/2 MHz, was investigated by using optical e...Effect of low-frequency power on F, CF2 relative density and F/CF2 ratio, in C2F6, C4F8 and CHF3 dual-frequency capacitively couple discharge driven by the power of 13.56 MHz/2 MHz, was investigated by using optical emission spectroscopy. High F, CF2 relative density and high F/CF2 ratio were obtained in a CHF3 plasma. But for C2F6 and C4Fs plasmas, the F, CF2 relative density and F/CF2 ratio all decreased significantly due to the difference in both reactive paths and reactive energy. The increase of LF power caused simultaneous increase of F and CF2 radical relative densities in C4Fs and CHF3 plasmas, but led to increase of F with the decrease in CF2 relative densities in C2F6 plasma due to the increase of lower energy electrons and the decrease of higher energy electrons in electron energy distribution function （EEDF）.展开更多
Structure properties of silicone oil serving as a liquid substrate exposed to Ar plasma axe investigated in this paper. Under the action of energetic Ar ions, the surface of silicone oil liquid substrate exhibits a br...Structure properties of silicone oil serving as a liquid substrate exposed to Ar plasma axe investigated in this paper. Under the action of energetic Ar ions, the surface of silicone oil liquid substrate exhibits a branch-like fractal aggregation structure, which is related to the structure evolution of silicone oil liquid from Si-O chain to Silo network. The radicals from the dissociation of silicone oil molecule into the Ar plasma turns the plasma into a reactive environment. Therefore, the structural evolution of silicone oil liquid substrate and the reactive radicals in the plasma space become possible factors to affect the aggregation of nanopaxticles and also the structures and the compositions of nanopaxticles.展开更多
基金supported by National Natural Science Foundation of China (Nos.10575074, 10635010)
文摘Effect of C：F deposition on SiCOH etching in a CHF3 dual-frequency capacitively couple plasma, driven by a high-frequency source of 60 MHz （HF） and a low-frequency source of 2 MHz （LF） simultaneously, is investigated. With the increase in LF power, the change of C：F layer from dense C：F layer to porous C：F layer and further to C：F filling gaps was observed, which led to the transition from films deposition to films etching. The change of C：F layer is related to the bombardment by energetic ions and CF2 concentration in the plasma. As the LF power increased to 35 - 40 W, the energetic ions and the low CF2 concentration led to a suppression of C：F deposition. Therefore, the SiCOH films can be etched at higher LF power.
基金supported by National Natural Science Foundation of China (Nos.10975105, 10575074, 10635010)
文摘Effect of low-frequency power on F, CF2 relative density and F/CF2 ratio, in C2F6, C4F8 and CHF3 dual-frequency capacitively couple discharge driven by the power of 13.56 MHz/2 MHz, was investigated by using optical emission spectroscopy. High F, CF2 relative density and high F/CF2 ratio were obtained in a CHF3 plasma. But for C2F6 and C4Fs plasmas, the F, CF2 relative density and F/CF2 ratio all decreased significantly due to the difference in both reactive paths and reactive energy. The increase of LF power caused simultaneous increase of F and CF2 radical relative densities in C4Fs and CHF3 plasmas, but led to increase of F with the decrease in CF2 relative densities in C2F6 plasma due to the increase of lower energy electrons and the decrease of higher energy electrons in electron energy distribution function （EEDF）.
基金Project supported by the National Natural Science Foundation of China (Grant Nos.10975105,10575074 and 10635010)
文摘Structure properties of silicone oil serving as a liquid substrate exposed to Ar plasma axe investigated in this paper. Under the action of energetic Ar ions, the surface of silicone oil liquid substrate exhibits a branch-like fractal aggregation structure, which is related to the structure evolution of silicone oil liquid from Si-O chain to Silo network. The radicals from the dissociation of silicone oil molecule into the Ar plasma turns the plasma into a reactive environment. Therefore, the structural evolution of silicone oil liquid substrate and the reactive radicals in the plasma space become possible factors to affect the aggregation of nanopaxticles and also the structures and the compositions of nanopaxticles.
