红光InAlAs量子点的结构和光学性质

利用ＭＢＥ方法在（００１）衬底上成功地生长了密度大、尺寸小、发红光的ＩｎＡｌＡｓ／Ａｌ－ＧａＡｓ 量子点结构． 通过原子力显微镜观测表明， ＩｎＡｌＡｓ量子点的密度和大小都随覆盖厚度的增加而增大； 发现Ａｌ原子的表面迁移率决定ＩｎＡｌＡｓ 量子点的形貌． 光荧光谱证实了量子点的发光峰值在红光范围， 并结合形貌的统计得到了量子点的发光峰展宽主要是受量子点的横向尺寸影响．

分别限制量子阱激光器的载流子限制特性及漏电流

本文在数值求解分别限制量子阶激光器的光增益及阈值电流密度的基础上，计算和分析了漂移和扩散两种机制引起的漏电流对半导体激光器阅值电流密度的影响讨论了激光器的结构参数与漏电流的关系。计算结果和实验值进行了比较。

GRINSCH-SQW激光器波导特性的数值分析

分析了具有缓变折射率分别限制单量子讲的波导特性。用有限差分方法解出了波导对于基模的等效折射率。在此基础上，通过计算波导中垂直子激光器结平面方向上的光强过场分布，进而求得有源层的光限制因子及各种波导结构参数对的影响。

MBE自组织生长多层竖直自对准InAs量子点结构的研究

利用ＭＢＥ方法在（００１）ＧａＡｓ衬底上生长了多层竖直自对准ＩｎＡｓ量子点结构．透射电子显微镜的观察表明，多层量子点成一系列柱状分布．同单层量子点相比，多层量子点的光荧光谱线发生红移．这表明由于量子点中载流子波函数的扩展和交迭，柱中量子点之间有耦合现象发生．

Observation of the Third Subband Population in Modulation-Doped InGaAs/InAlAs Heterostructure

The population of the third(n=3)two-dimensional electron subband of InGaAs/InAlAs modulation-doped structures has been observed by means of Fourier transform photoluminescence(PL).Three well resolved PL peaks centred at 0.737,0.908,and 0.980eV are observed,which are attributed to the transitions from the lowest three electron subbands to the n=1 heavy-hole subband.The subband separations clearly exhibiting the features of the stepped quantum well with triangle and square potentials are consistent with numerical calculation.Thanks to the presence of Fermi cutoff,the population ratio of these three subbands can be estimated.Temperature and excitation-dependent luminescences are also analyzed.

Abnormal Alignment of Misfit Dislocations in In_(0.52)Al_(0.48)As/In_(x)Ga_(1-x)As/In_(0.52)Al(0.48)As/InP Heterostructure

It was observed with transmission electron microscopy in the In_(0.52)Al_(0.48)As/In_(x)Ga_(1-x)As/In_(0.52)Al(0.48)As/InP heterostructure that misfit dislocation lines deviate from the<110>directions at a certain angle depending on the indium content x.Such an abnormal alignment of misfit dislocations is explained in terms of an alloy effect on the formation of single jogs on the misfit dislocations in the interface between the Ⅲ-Ⅳ ternary compounds.

液相外延生长超薄有源层Al_xGa_（1－x）As／GaAs分别限制双异质结构激光器

报道超薄有源层ＡｌｘＧａ１－ｘＡＳ／ＧａＡｓ分别限制双异质结构半导体激光器的液相外延的过程。讨论了过冷度、生长温度和降温速率等对生长速率的影响。扫描电镜测得生长温度为６８０℃时，ＧａＡｓ有源层厚度可低至２５～３５ｎｍ。宽接触分别限制双异质结构ＬＤｓ的室温连续阈值电流密度多在７００～８００Ａ／ｃｍ２。