The anodization of Al film on InP substrate and properties of anodic Al<sub>2</sub>O<sub>3</sub>3/InPhave been investigated by AES,DLTS,I-V,C-V and ellipsometer.The results show that theanodic ...The anodization of Al film on InP substrate and properties of anodic Al<sub>2</sub>O<sub>3</sub>3/InPhave been investigated by AES,DLTS,I-V,C-V and ellipsometer.The results show that theanodic oxide Al<sub>2</sub>O<sub>3</sub> has a permittivity of 11~12 and a resistivity of 1.3×10<sup>13</sup> ohm-cm.Interfacestate density at Al<sub>2</sub>O<sub>3</sub>/InP is about 10<sup>11</sup> cm<sup>-2</sup>·eV<sup>-1</sup>.DLTS reveals that there is a continuouslydistributed interface electron traps at Al<sub>2</sub>O<sub>3</sub>/InP interface.Anodic Al<sub>2</sub>O<sub>3</sub> exhibits good stabilityand electrical properties and could be used for passivation,diffusion mask and gate insulator,etc.展开更多
文摘The anodization of Al film on InP substrate and properties of anodic Al<sub>2</sub>O<sub>3</sub>3/InPhave been investigated by AES,DLTS,I-V,C-V and ellipsometer.The results show that theanodic oxide Al<sub>2</sub>O<sub>3</sub> has a permittivity of 11~12 and a resistivity of 1.3×10<sup>13</sup> ohm-cm.Interfacestate density at Al<sub>2</sub>O<sub>3</sub>/InP is about 10<sup>11</sup> cm<sup>-2</sup>·eV<sup>-1</sup>.DLTS reveals that there is a continuouslydistributed interface electron traps at Al<sub>2</sub>O<sub>3</sub>/InP interface.Anodic Al<sub>2</sub>O<sub>3</sub> exhibits good stabilityand electrical properties and could be used for passivation,diffusion mask and gate insulator,etc.