On the origin of carrier localization in AlInAsSb digital alloy

We compared the photoluminescence(PL)properties of Al In As Sb digital alloy samples with different periods grown on Ga Sb(001)substrates by molecular beam epitaxy.Temperature-dependent S-shape behavior is observed and explained using a thermally activated redistribution model within a Gaussian distribution of localized states.There are two different mechanisms for the origin of the PL intensity quenching for the Al In As Sb digital alloy.The high-temperature activation energy E_(1)is positively correlated with the interface thickness,whereas the low-temperature activation energy E_(2)is negatively correlated with the interface thickness.A quantitative high-angle annular dark-field scanning transmission electron microscopy(HAADF-STEM)study shows that the interface quality improves as the interface thickness increases.Our results confirm that E_(1)comes from carrier trapping at a state in the In Sb interface layer,while E_(2)originates from the exciton binding energy due to the roughness of the Al As interface layer.

Growth of high material quality InAs/GaSb type-Ⅱ superlattice for long-wavelength infrared range by molecular beam epitaxy

By optimizing theⅤ/Ⅲbeam-equivalent pressure ratio,a high-quality InAs/GaSb type-Ⅱsuperlattice material for the long-wavelength infrared(LWIR)range is achieved by molecular beam epitaxy(MBE).High-resolution x-ray diffraction(HRXRD),atomic force microscopy(AFM),and Fourier transform infrared(FTIR)spectrometer are used to characterize the material growth quality.The results show that the full width at half maximum(FWHM)of the superlattice zero-order diffraction peak,the mismatching of the superlattice zero-order diffraction peak between the substrate diffraction peaks,and the surface roughness get the best results when the beam-equivalent pressure(BEP)ratio reaches the optimal value,which are 28 arcsec,13 arcsec,and 1.63?,respectively.The intensity of the zero-order diffraction peak is strongest at the optimal value.The relative spectral response of the LWIR detector shows that it exhibits a 100%cut-off wavelength of 12.6μm at 77 K.High-quality epitaxial materials have laid a good foundation for preparing high-performance LWIR detector.