The special any-polar resistive switching mode includes the coexistence and stable conversion between the unipolar and the bipolar resistive switching mode under the same compliance current.In the present work,the any...The special any-polar resistive switching mode includes the coexistence and stable conversion between the unipolar and the bipolar resistive switching mode under the same compliance current.In the present work,the any-polar resistive switching mode is demonstrated when thin Ti intercalations are introduced into both sides of Pt/HfO_(2)/Pt RRAM device.The role of the Ti intercalations contributes to the fulfillment of the any-polar resistive switching working mechanism,which lies in the filament constructed by the oxygen vacancies and the effective storage of the oxygen ion at both sides of the electrode interface.展开更多
A near-infrared germanium(Ge)Schottky photodetector(PD)with an ultrathin silicon(Si)barrier enhancement layer between the indium-doped tin oxide(ITO)electrode and Ge epilayer on Si or silicon-on-insulator(SOI)is propo...A near-infrared germanium(Ge)Schottky photodetector(PD)with an ultrathin silicon(Si)barrier enhancement layer between the indium-doped tin oxide(ITO)electrode and Ge epilayer on Si or silicon-on-insulator(SOI)is proposed and fabricated.The well-behaved ITO/Si cap/Ge Schottky junctions without intentional doping process for the Ge epilayer are formed on the Si and SOI substrates.The Si-and SOI-based ITO/Si cap/Ge Schottky PDs exhibit low dark current densities of 33 mA/cm2 and 44 mA/cm2,respectively.Benefited from the high transmissivity of ITO electrode and the reflectivity of SOI substrate,an optical responsivity of 0.19 A/W at 1550 nm wavelength is obtained for the SOI-based ITO/Si cap/Ge Schottky PD.These complementary metal–oxide–semiconductor(CMOS)compatible Si(or SOI)-based ITO/Si cap/Ge Schottky PDs are quite useful for detecting near-infrared wavelengths with high efficiency.展开更多
The computer program AMPS-1D（analysis of microelectronic and photonic structures） has been employed to simulate the performance of the a-Si：H/a-SiGe：H/a-SiGe：H triple-junction solar cell at the radiation of AM1.5...The computer program AMPS-1D（analysis of microelectronic and photonic structures） has been employed to simulate the performance of the a-Si：H/a-SiGe：H/a-SiGe：H triple-junction solar cell at the radiation of AM1.5G（100 mW/cm2/ and room temperature. Firstly, three sub-cells with band gaps of 1.8, 1.6 and 1.4 eV are simulated, respectively. The simulation results indicate that the density of defect states is an important factor, which affects the open circuit voltage and the filling factor of the solar cell. The two-step current matching method and the control variate method are employed in the simulation. The results show that the best solar cell performance would be achieved when the intrinsic layer thickness from top to bottom is set to be 70, 180 and 220 nm, respectively. We also optimize the tunnel-junction structure of the solar cell reasonably, the simulation results show that the open circuit voltage, filling factor and conversion efficiency are all improved and the S-shape current density–voltage curve disappears during optimizing the tunnel-junction structure. Besides, the diagram of the energy band and the carrier recombination rate are also analyzed. Finally, our simulation data are compared to the experimental data published in other literature. It is demonstrated that the numerical results agree with the experimental ones very well.展开更多
硅基光电集成回路是信息时代最具影响力的核心技术之一,由硅基光源、光电探测器、光调制器等模块组成.硅材料是微电子集成电路的基石,然而在光电集成方面却遇到了瓶颈.首先,由于硅是间接带隙材料,其发光效率极低,因此难以应用于硅基高...硅基光电集成回路是信息时代最具影响力的核心技术之一,由硅基光源、光电探测器、光调制器等模块组成.硅材料是微电子集成电路的基石,然而在光电集成方面却遇到了瓶颈.首先,由于硅是间接带隙材料,其发光效率极低,因此难以应用于硅基高效光源的研制.其次,硅在近红外通讯波段吸收系数很低,因此在近红外光电探测器的应用中具有较大的局限性.然而,研究者发现,通过能带工程将硅与其他Ⅳ族材料相融合不仅可以有效提高直接带高效发光效率,同时能使材料在近红外波段具有较高的吸收系数.因此,以Ⅳ族材料为基础,与硅工艺兼容的硅基光电集成回路引起了研究者的广泛关注.本文综述了课题组在硅基材料外延生长及其发光和探测器件方面的研究进展.介绍了硅基Ⅳ族材料Ge,SiGe/Ge异质结和量子阱材料的外延生长技术,以及硅基GeSn量子点发光材料的制备新方法.基于硅基Ⅳ族异质结构材料,发展调制金属与半导体接触势垒高度新机理,研制了多种结构的光电探测器.设计并制备了与互补金属氧化物半导体(Complementary Metal Oxide Semiconductor,CMOS)结构兼容的横向异质结以及双有源区垂直共振腔型两种结构硅基电致发光器件,有效提升器件的发光性能,并观察到应变锗发光增益现象.展开更多
基金National Natural Science Foundation of China(Nos.62004087,12164051)Natural Science Foundation of Fujian Province(No.2020J01815)the Natural Science Foundation of Zhangzhou(No.ZZ2020J32).
基金Project supported by the National Natural Science Foundation of China(Grant Nos.62004087,61474081,and 61534005)the Natural Science Foundation of Fujian Province,China(Grant No.2020J01815)+1 种基金the Natural Science Foundation of Zhangzhou,China(Grant No.ZZ2020J32)the Natural Science Foundation of Jiangxi Province,China(Grant No.20192ACBL20048).
文摘The special any-polar resistive switching mode includes the coexistence and stable conversion between the unipolar and the bipolar resistive switching mode under the same compliance current.In the present work,the any-polar resistive switching mode is demonstrated when thin Ti intercalations are introduced into both sides of Pt/HfO_(2)/Pt RRAM device.The role of the Ti intercalations contributes to the fulfillment of the any-polar resistive switching working mechanism,which lies in the filament constructed by the oxygen vacancies and the effective storage of the oxygen ion at both sides of the electrode interface.
基金Project supported by the National Key Research and Development Program of China(Grant No.2018YFB2200103)the National Natural Science Foundation of China(Grant No.61474094)Principal Fund of Minnan Normal University(Grant No.KJ2020006).
文摘A near-infrared germanium(Ge)Schottky photodetector(PD)with an ultrathin silicon(Si)barrier enhancement layer between the indium-doped tin oxide(ITO)electrode and Ge epilayer on Si or silicon-on-insulator(SOI)is proposed and fabricated.The well-behaved ITO/Si cap/Ge Schottky junctions without intentional doping process for the Ge epilayer are formed on the Si and SOI substrates.The Si-and SOI-based ITO/Si cap/Ge Schottky PDs exhibit low dark current densities of 33 mA/cm2 and 44 mA/cm2,respectively.Benefited from the high transmissivity of ITO electrode and the reflectivity of SOI substrate,an optical responsivity of 0.19 A/W at 1550 nm wavelength is obtained for the SOI-based ITO/Si cap/Ge Schottky PD.These complementary metal–oxide–semiconductor(CMOS)compatible Si(or SOI)-based ITO/Si cap/Ge Schottky PDs are quite useful for detecting near-infrared wavelengths with high efficiency.
基金Project supported by the National Natural Science Foundation of China(Nos.11274266,10990103)Science and Technology Projectof Yunnan University(No.2012CG008)the Key Project of Applied Basic Research Program of Yunnan Province of China(No.2013FA029)
文摘The computer program AMPS-1D（analysis of microelectronic and photonic structures） has been employed to simulate the performance of the a-Si：H/a-SiGe：H/a-SiGe：H triple-junction solar cell at the radiation of AM1.5G（100 mW/cm2/ and room temperature. Firstly, three sub-cells with band gaps of 1.8, 1.6 and 1.4 eV are simulated, respectively. The simulation results indicate that the density of defect states is an important factor, which affects the open circuit voltage and the filling factor of the solar cell. The two-step current matching method and the control variate method are employed in the simulation. The results show that the best solar cell performance would be achieved when the intrinsic layer thickness from top to bottom is set to be 70, 180 and 220 nm, respectively. We also optimize the tunnel-junction structure of the solar cell reasonably, the simulation results show that the open circuit voltage, filling factor and conversion efficiency are all improved and the S-shape current density–voltage curve disappears during optimizing the tunnel-junction structure. Besides, the diagram of the energy band and the carrier recombination rate are also analyzed. Finally, our simulation data are compared to the experimental data published in other literature. It is demonstrated that the numerical results agree with the experimental ones very well.
文摘硅基光电集成回路是信息时代最具影响力的核心技术之一,由硅基光源、光电探测器、光调制器等模块组成.硅材料是微电子集成电路的基石,然而在光电集成方面却遇到了瓶颈.首先,由于硅是间接带隙材料,其发光效率极低,因此难以应用于硅基高效光源的研制.其次,硅在近红外通讯波段吸收系数很低,因此在近红外光电探测器的应用中具有较大的局限性.然而,研究者发现,通过能带工程将硅与其他Ⅳ族材料相融合不仅可以有效提高直接带高效发光效率,同时能使材料在近红外波段具有较高的吸收系数.因此,以Ⅳ族材料为基础,与硅工艺兼容的硅基光电集成回路引起了研究者的广泛关注.本文综述了课题组在硅基材料外延生长及其发光和探测器件方面的研究进展.介绍了硅基Ⅳ族材料Ge,SiGe/Ge异质结和量子阱材料的外延生长技术,以及硅基GeSn量子点发光材料的制备新方法.基于硅基Ⅳ族异质结构材料,发展调制金属与半导体接触势垒高度新机理,研制了多种结构的光电探测器.设计并制备了与互补金属氧化物半导体(Complementary Metal Oxide Semiconductor,CMOS)结构兼容的横向异质结以及双有源区垂直共振腔型两种结构硅基电致发光器件,有效提升器件的发光性能,并观察到应变锗发光增益现象.
