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SiON界面层对铪基FeFET栅缺陷影响的第一性原理研究
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作者 柴俊帅 徐昊 +3 位作者 王晓磊 罗军 王文武 叶甜春 《微纳电子与智能制造》 2023年第3期35-40,共6页
SiON界面层是提升铪基铁电场效应晶体管疲劳特性的一个有效方法,然而,其物理机制目前尚不清楚。在这项工作中,基于第一性原理计算,通过构建结构为o-Hf_(0.5)Zr_(0.5)O_(2)/SiON/Si和o-Hf_(0.5)Zr_(0.5)O_(2)/SiO_(2)/Si的铪基Fe FET栅... SiON界面层是提升铪基铁电场效应晶体管疲劳特性的一个有效方法,然而,其物理机制目前尚不清楚。在这项工作中,基于第一性原理计算,通过构建结构为o-Hf_(0.5)Zr_(0.5)O_(2)/SiON/Si和o-Hf_(0.5)Zr_(0.5)O_(2)/SiO_(2)/Si的铪基Fe FET栅堆叠原子模型,系统的研究了SiON界面层对铪基FeFET栅缺陷的影响。发现相比于o-Hf_(0.5)Zr_(0.5)O_(2)/SiO_(2)/Si栅结构,o-Hf_(0.5)Zr_(0.5)O_(2)/SiON/Si栅结构中o-Hf_(0.5)Zr_(0.5)O_(2)/SiON界面氧空位缺陷更易形成,促进电荷注入,而o-Hf_(0.5)Zr_(0.5)O_(2)/SiON界面和Hf_(0.5)Zr_(0.5)O_(2)体内氧空位缺陷的电荷转变能级普遍远离硅衬底带隙,抑制电荷注入。提出以上两种现象的共同作用对铪基FeFET器件疲劳特性的提升具有重要贡献。 展开更多
关键词 铁电场效应晶体管 氧化铪 疲劳特性 栅缺陷 第一性原理计算
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Charge trapping effect at the interface of ferroelectric/interlayer in the ferroelectric field effect transistor gate stack
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作者 孙晓清 徐昊 +2 位作者 柴俊帅 王晓磊 王文武 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第8期457-464,共8页
We study the charge trapping phenomenon that restricts the endurance of n-type ferroelectric field-effect transistors(FeFETs)with metal/ferroelectric/interlayer/Si(MFIS)gate stack structure.In order to explore the phy... We study the charge trapping phenomenon that restricts the endurance of n-type ferroelectric field-effect transistors(FeFETs)with metal/ferroelectric/interlayer/Si(MFIS)gate stack structure.In order to explore the physical mechanism of the endurance failure caused by the charge trapping effect,we first establish a model to simulate the electron trapping behavior in n-type Si FeFET.The model is based on the quantum mechanical electron tunneling theory.And then,we use the pulsed I_d-V_g method to measure the threshold voltage shift between the rising edges and falling edges of the FeFET.Our model fits the experimental data well.By fitting the model with the experimental data,we get the following conclusions.(i)During the positive operation pulse,electrons in the Si substrate are mainly trapped at the interface between the ferroelectric(FE)layer and interlayer(IL)of the FeFET gate stack by inelastic trap-assisted tunneling.(ii)Based on our model,we can get the number of electrons trapped into the gate stack during the positive operation pulse.(iii)The model can be used to evaluate trap parameters,which will help us to further understand the fatigue mechanism of FeFET. 展开更多
关键词 FERROELECTRIC INTERFACE ferroelectric field-effect transistors(FeFETs) charge trapping
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Insight into influence of thermodynamic coefficients on transient negative capacitance in Zr-doped HfO_(2) ferroelectric capacitors
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作者 Yuan-Yuan Zhang Xiao-Qing Sun +6 位作者 Jun-Shuai Chai Hao Xu Xue-Li Ma Jin-Juan Xiang Kai Han Xiao-Lei Wang Wen-Wu Wang 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第12期591-595,共5页
We study the influence of the thermodynamic coefficients on transient negative capacitance for the Zr-doped HfO_(2)(HZO)ferroelectric capacitors by the theoretical simulation based on the Landau-Khalatnikov(L-K)theory... We study the influence of the thermodynamic coefficients on transient negative capacitance for the Zr-doped HfO_(2)(HZO)ferroelectric capacitors by the theoretical simulation based on the Landau-Khalatnikov(L-K)theory and experimental measurement of electrical properties in the resistor-ferroelectric capacitor(R-FEC)circuit.Our results show that the thermodynamic coefficientsα,βandγalso play a key role for the transient NC effect besides the viscosity coefficient and series resistor.Moreover,the smaller coefficientsαandβ,the more significant the transient NC effect.In addition,we also find that the thermodynamic process of transient NC does not obey the generally accepted viewpoint of Gibbs free energy minimization. 展开更多
关键词 transient negative capacitance(NC) FERROELECTRIC hafnium-zirconium oxide
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