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Optical rectification in surface layers of germanium
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作者 张丽 李方野 +10 位作者 王帅 王琦 栾凯然 陈曦 刘秀环 裘令瑛 陈占国 赵纪红 侯丽新 高延军 贾刚 《Chinese Optics Letters》 SCIE EI CAS CSCD 2018年第10期70-73,共4页
In this Letter, we have demonstrated significant electric field induced(EFI) optical rectification(OR) effects existing in the surface layers of germanium(Ge) and measured the distributions of EFI OR signals alo... In this Letter, we have demonstrated significant electric field induced(EFI) optical rectification(OR) effects existing in the surface layers of germanium(Ge) and measured the distributions of EFI OR signals along the normal directions of surface layers of Ge samples. Based on the experimental results, the ratios of the twoe-order susceptibility components χ2 effTzzz∕χe2 effTeffective secondzxxfor Ge(001), Ge(110), and Ge(111) surface layers can be estimated to be about 0.92, 0.91, and 1.07, respectively. The results indicate that the EFI OR can be used for analyzing the properties on surface layers of Ge, which has potential applications in Ge photonics and optoelectronics. 展开更多
关键词 EFI 110 In Optical rectification in surface layers of germanium
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