利用有限元分析软件数值模拟了固体激光器系统中由单晶硅(Silicon)、石英(Silica)与超低膨胀玻璃(ULE)等不同材料制作的变形反射镜受激光辐照下的热畸变特性。计算结果表明:当入射激光功率密度为0.225 k W/cm^2,激光照射时间为10 s,镜...利用有限元分析软件数值模拟了固体激光器系统中由单晶硅(Silicon)、石英(Silica)与超低膨胀玻璃(ULE)等不同材料制作的变形反射镜受激光辐照下的热畸变特性。计算结果表明:当入射激光功率密度为0.225 k W/cm^2,激光照射时间为10 s,镜面反射率为99.9%时,三种材料的变形镜的最大温升分别为0.804、6.751与7.122℃,最大热变形分别为0.049 3、0.034 8与0.005 4μm,相比之下,单晶硅温升较小,超低膨胀玻璃(ULE)的变形与应力最小,ULE是未来比较理想的镜面材料。最后,对变形镜在长脉冲激光辐照下也进行了计算与分析。展开更多
YbF3 is proposed as a substitute for ThF4 in anti-reflection or reflection coatings in the infrared （IR） range. In this letter, we study on the properties of the YbF3 thin film deposited with different deposition pa...YbF3 is proposed as a substitute for ThF4 in anti-reflection or reflection coatings in the infrared （IR） range. In this letter, we study on the properties of the YbF3 thin film deposited with different deposition parameters, and find the deposition rate of YbF3 has a large effect on the substrate particles deposition both on number and area. Moreover, we find the deposition temperature is a main factor of element content. In the end, we produce an anti-reflection coating on Ge substrate, and its average transmission reaches 99.5%, which can satisfy the practical requirement.展开更多
文摘YbF3 is proposed as a substitute for ThF4 in anti-reflection or reflection coatings in the infrared （IR） range. In this letter, we study on the properties of the YbF3 thin film deposited with different deposition parameters, and find the deposition rate of YbF3 has a large effect on the substrate particles deposition both on number and area. Moreover, we find the deposition temperature is a main factor of element content. In the end, we produce an anti-reflection coating on Ge substrate, and its average transmission reaches 99.5%, which can satisfy the practical requirement.
