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产维生素K_2黄杆菌复合诱变及发酵优化 被引量:5
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作者 檀沐 赵根海 +3 位作者 刘会 李哲敏 孙小雯 郑之明 《辐射研究与辐射工艺学报》 CAS CSCD 2015年第4期39-47,共9页
利用亚硝基胍(NTG)和低能氮离子束(N+)注入复合诱变方法,获得产维生素K2黄杆菌(Flavobacterium sp.)菌株,并对突变菌株发酵条件进行优化,进一步提高黄杆菌产维生素K2的能力。确定最佳诱变条件为:NTG处理浓度0.8 mg/m L,处理时间20 min;N... 利用亚硝基胍(NTG)和低能氮离子束(N+)注入复合诱变方法,获得产维生素K2黄杆菌(Flavobacterium sp.)菌株,并对突变菌株发酵条件进行优化,进一步提高黄杆菌产维生素K2的能力。确定最佳诱变条件为:NTG处理浓度0.8 mg/m L,处理时间20 min;N+离子注入能量15 ke V,80(2.6×1013 cm?2),突变菌维生素K2产量为6.12 mg/L,较原始菌株提高了159%。突变菌传代6次,维生素K2产量稳定。进一步优化突变菌发酵条件,确定最优发酵条件为:温度37℃、起始p H=7.0,装液量30 m L/250 m L,接种量2%、摇床转速120r/min,发酵后72 h添加3 mg/m L花生衣(Arachis hypogaea)作为诱导物,优化后的菌株维生素K2产量较优化前提高31%。 展开更多
关键词 黄杆菌 亚硝基胍 氮离子注入 维生素K2
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Improvement of Vitamin K_2 Production by Escherichia sp.with Nitrogen Ion Beam Implantation Induction 被引量:1
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作者 刘艳 王丽 +8 位作者 郑之明 王鹏 赵根海 刘会 贡国鸿 吴荷芳 刘红霞 檀沐 李哲敏 《Plasma Science and Technology》 SCIE EI CAS CSCD 2015年第2期159-166,共8页
Low-energy ion implantation as a novel mutagen has been increasingly applied in the microbial mutagenesis for its higher mutation frequency and wider mutation spectra. In this work, N^+ ion beam implantation was used... Low-energy ion implantation as a novel mutagen has been increasingly applied in the microbial mutagenesis for its higher mutation frequency and wider mutation spectra. In this work, N^+ ion beam implantation was used to enhance Escherichia sp. in vitamin K2 yield. Optimization of process parameters under submerged fermentation was carried out to improve the vitamin K2 yield of mutant FM5-632. The results indicate that an excellent mutant FM5-632 with a yield of 123.2±1.6 μg/L, that is four times that of the original strain, was achieved by eight successive implantations under the conditions of 15 keV and 60 ×2.6 ×10^13 ions/cm^2. A further optimization increased the yield of the mutant by 39.7%, i.e. 172.1±1.2 μg/L which occurred in the mutant cultivated in the optimal fermentation culture medium composed of (per liter): 15.31 g glycerol, 10 g peptone, 2.89 g yeast extract, 5 g K2HPO4, 1 g NaCl, 0.5 g MgSO4·7H2O and 0.04 g cedar wood oil, incubated at 33 ℃, pH 7.0 and 180 rpm for 120 h. 展开更多
关键词 vitamin K2 Escherichia sp. low-energy ion implantation
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