Studies on first GaN-based blue-violet laser diodes(LDs) in China mainland are reported.High quality GaN materials as well as GaN-based quantum wells laser structures are grown by metal-organic chemical vapor depositi...Studies on first GaN-based blue-violet laser diodes(LDs) in China mainland are reported.High quality GaN materials as well as GaN-based quantum wells laser structures are grown by metal-organic chemical vapor deposition method.The X-ray double-crystal diffraction rocking curve measurements show the full-width half maximum of 180″ and 185″ for (0002) symmetric reflection and (10 12) skew reflection,respectively.A room temperature mobility of 850cm2/(V·s) is obtained for a 3μm thick GaN film.Gain guided and ridge geometry waveguide laser diodes are fabricated with cleaved facet mirrors at room temperature under pulse current injection.The lasing wavelength is 405 9nm.A threshold current density of 5kA/cm2 and an output light power over 100mW are obtained for ridge geometry waveguide laser diodes.展开更多
利用 MOCVD生长技术在 Ga As(10 0 )衬底上生长了高质量的立方相 Al Ga N薄膜 .通过光致发光 (PL )、扫描电镜 (SEM)分析了不同 NH3流量、不同生长温度对 Al Ga N外延层的结晶质量和表面形貌的影响 .发现相对高的 NH3流量和相对高的生...利用 MOCVD生长技术在 Ga As(10 0 )衬底上生长了高质量的立方相 Al Ga N薄膜 .通过光致发光 (PL )、扫描电镜 (SEM)分析了不同 NH3流量、不同生长温度对 Al Ga N外延层的结晶质量和表面形貌的影响 .发现相对高的 NH3流量和相对高的生长温度可以提高 Al Ga展开更多
High quality cubic GaN (c GaN) is grown by metalorganic vapor deposition (MOCVD) at an increased growth temperature of 900℃,with the growth rate of 1 6μm/h.The full width at half maximum (FWHM) of room temperature...High quality cubic GaN (c GaN) is grown by metalorganic vapor deposition (MOCVD) at an increased growth temperature of 900℃,with the growth rate of 1 6μm/h.The full width at half maximum (FWHM) of room temperature photoluminescence (PL) for the high temperature grown GaN film is 48meV.It is smaller than that of the sample grown at 830℃.In X ray diffraction (XRD) measurement,the high temperature grown GaN shows a (002) peak at 20° with a FWHM of 21′.It can be concluded that,although c GaN is of metastable phase,high growth temperature is still beneficial to the improvement in its crystal quality.The relationship between the growth rate and growth temperature is also discussed.展开更多
InGaN/GaN-multiple-quantum-well-based light emitting diode （LED） nanopillar arrays with a diameter of approximately 200nm and a height of 700nm are fabricated by inductively coupled plasma etching using Ni self- ass...InGaN/GaN-multiple-quantum-well-based light emitting diode （LED） nanopillar arrays with a diameter of approximately 200nm and a height of 700nm are fabricated by inductively coupled plasma etching using Ni self- assembled nanodots as etching mask. In comparison to the as-grown LED sample an enhancement by a factor of four of photoluminescence （PL） intensity is achieved after the fabrication of nanopillars, and a blue shift and a decrease of full width at half maximum of the PL peak are observed. The method of additional wet etching with different chemical solutions is used to remove the etch-induced damage. The result shows that the dilute HCl （HCI：H2O=1：1） treatment is the most effective. The PL intensity of nanopillar LEDs after such a treatment is about 3.5 times stronger than that before treatment.展开更多
We report our recent progress of investigations on InGaN-based blue-violet laser diodes （LDs）. The roomtemperature （RT） cw operation lifetime of LDs has extended to longer than 15.6 h. The LD structure was grown o...We report our recent progress of investigations on InGaN-based blue-violet laser diodes （LDs）. The roomtemperature （RT） cw operation lifetime of LDs has extended to longer than 15.6 h. The LD structure was grown on a c-plane free-standing （FS） GaN substrate by metal organic chemical vapor deposition （MOCVD）. The typical threshold current and voltage of LD under RT cw operation are 78 mA and 6.8 V, respectively. The experimental analysis of degradation of LD performances suggests that after aging treatment, the increase of series resistance and threshold current can be mainly attributed to the deterioration of p-type ohmic contact and the decrease of internal quantum efticiency of multiple quantum well （MQW）, respectively.展开更多
Properties of the Ag/Ni/p-GaN structure at different temperatures are studied by Auger electron spectroscopy, scanning electron microscopy and high resolution x-ray diffraction. The effect of Ag in ohmic contact on th...Properties of the Ag/Ni/p-GaN structure at different temperatures are studied by Auger electron spectroscopy, scanning electron microscopy and high resolution x-ray diffraction. The effect of Ag in ohmic contact on the crystalline quality is investigated and the optimized value of annealing temperature is reported. The lowest specific contact resistance of 2.5 × 10^-4 Ωcm^2 is obtained at annealing temperature of 550^o C.展开更多
Room-temperature operation of cw GaN based multi-quantum-well laser diodes （LDs） is demonstrated. The LD structure is grown on a sapphire （0001） substrate by metalorganic chemical vapour deposition. A 2.5μm ×...Room-temperature operation of cw GaN based multi-quantum-well laser diodes （LDs） is demonstrated. The LD structure is grown on a sapphire （0001） substrate by metalorganic chemical vapour deposition. A 2.5μm × 800μm ridge waveguide structure is fabricated. The electrical and optical characteristics of the laser diode under direct current injection at room temperature are investigated. The threshold current and voltage of the LD under cw operation are 110mA and 10.5V, respectively. Thermal induced series resistance decrease and emission wavelength red-shift are observed as the injection current is increased. The full width at half maximum for the parallel and perpendicular far field pattern （FFP） are 12° and 32°, respectively.展开更多
文摘Studies on first GaN-based blue-violet laser diodes(LDs) in China mainland are reported.High quality GaN materials as well as GaN-based quantum wells laser structures are grown by metal-organic chemical vapor deposition method.The X-ray double-crystal diffraction rocking curve measurements show the full-width half maximum of 180″ and 185″ for (0002) symmetric reflection and (10 12) skew reflection,respectively.A room temperature mobility of 850cm2/(V·s) is obtained for a 3μm thick GaN film.Gain guided and ridge geometry waveguide laser diodes are fabricated with cleaved facet mirrors at room temperature under pulse current injection.The lasing wavelength is 405 9nm.A threshold current density of 5kA/cm2 and an output light power over 100mW are obtained for ridge geometry waveguide laser diodes.
文摘利用 MOCVD生长技术在 Ga As(10 0 )衬底上生长了高质量的立方相 Al Ga N薄膜 .通过光致发光 (PL )、扫描电镜 (SEM)分析了不同 NH3流量、不同生长温度对 Al Ga N外延层的结晶质量和表面形貌的影响 .发现相对高的 NH3流量和相对高的生长温度可以提高 Al Ga
文摘High quality cubic GaN (c GaN) is grown by metalorganic vapor deposition (MOCVD) at an increased growth temperature of 900℃,with the growth rate of 1 6μm/h.The full width at half maximum (FWHM) of room temperature photoluminescence (PL) for the high temperature grown GaN film is 48meV.It is smaller than that of the sample grown at 830℃.In X ray diffraction (XRD) measurement,the high temperature grown GaN shows a (002) peak at 20° with a FWHM of 21′.It can be concluded that,although c GaN is of metastable phase,high growth temperature is still beneficial to the improvement in its crystal quality.The relationship between the growth rate and growth temperature is also discussed.
基金Supported by the National Natural Science Foundation of China under Grant Nos 60506001, 60776047, 60476021 and 60576003, and the National Basic Research Programme of China under Grant No 2007CB936700.
文摘InGaN/GaN-multiple-quantum-well-based light emitting diode （LED） nanopillar arrays with a diameter of approximately 200nm and a height of 700nm are fabricated by inductively coupled plasma etching using Ni self- assembled nanodots as etching mask. In comparison to the as-grown LED sample an enhancement by a factor of four of photoluminescence （PL） intensity is achieved after the fabrication of nanopillars, and a blue shift and a decrease of full width at half maximum of the PL peak are observed. The method of additional wet etching with different chemical solutions is used to remove the etch-induced damage. The result shows that the dilute HCl （HCI：H2O=1：1） treatment is the most effective. The PL intensity of nanopillar LEDs after such a treatment is about 3.5 times stronger than that before treatment.
基金Supported by the National Natural Science Foundation of China under Grant Nos 60976045, 60506001, 60776047 and 60836003, and the National Basic Research Program of China under Grant No 2007CB936700.
文摘We report our recent progress of investigations on InGaN-based blue-violet laser diodes （LDs）. The roomtemperature （RT） cw operation lifetime of LDs has extended to longer than 15.6 h. The LD structure was grown on a c-plane free-standing （FS） GaN substrate by metal organic chemical vapor deposition （MOCVD）. The typical threshold current and voltage of LD under RT cw operation are 78 mA and 6.8 V, respectively. The experimental analysis of degradation of LD performances suggests that after aging treatment, the increase of series resistance and threshold current can be mainly attributed to the deterioration of p-type ohmic contact and the decrease of internal quantum efticiency of multiple quantum well （MQW）, respectively.
文摘Properties of the Ag/Ni/p-GaN structure at different temperatures are studied by Auger electron spectroscopy, scanning electron microscopy and high resolution x-ray diffraction. The effect of Ag in ohmic contact on the crystalline quality is investigated and the optimized value of annealing temperature is reported. The lowest specific contact resistance of 2.5 × 10^-4 Ωcm^2 is obtained at annealing temperature of 550^o C.
基金Supported by the National Natural Science Foundation of China under Grant Nos 60506001, 60476021 and 60576003, and the National Basic Research Programme of China under Grant No 2007CB936700.
文摘Room-temperature operation of cw GaN based multi-quantum-well laser diodes （LDs） is demonstrated. The LD structure is grown on a sapphire （0001） substrate by metalorganic chemical vapour deposition. A 2.5μm × 800μm ridge waveguide structure is fabricated. The electrical and optical characteristics of the laser diode under direct current injection at room temperature are investigated. The threshold current and voltage of the LD under cw operation are 110mA and 10.5V, respectively. Thermal induced series resistance decrease and emission wavelength red-shift are observed as the injection current is increased. The full width at half maximum for the parallel and perpendicular far field pattern （FFP） are 12° and 32°, respectively.
