应用生长界面标记技术,标记不同调制电流密度通过固—液界面生长的区域,用离子探针测量各区域中溶质 Y 的相对浓度,得到在±7mAcm^(-2)的调制电流密度范围内,Y 的相对浓度与调制电流密度成正比。并研究了二个不同周期的交变的调制...应用生长界面标记技术,标记不同调制电流密度通过固—液界面生长的区域,用离子探针测量各区域中溶质 Y 的相对浓度,得到在±7mAcm^(-2)的调制电流密度范围内,Y 的相对浓度与调制电流密度成正比。并研究了二个不同周期的交变的调制电流或一个给定周期的调制电流和一个温度波动同时引入生界面对溶质 Y 分凝影响,观察到二种不同周期的波动在生长界面耦合形成的复杂调制结构的生长层。展开更多
In melt growth there are facetted and non-facetted growth sections, and longrange strain fields associated with the boundaries of two sections have been observed. In solution growth, similar phenomena have been observ...In melt growth there are facetted and non-facetted growth sections, and longrange strain fields associated with the boundaries of two sections have been observed. In solution growth, similar phenomena have been observed near the boundaries between different growth prisms. In order to elucidate the origin of these long-range strain fields, we have studied the morphology of growth striae on the boundaries between facetted and non-facetted growth sections in Czochralski-grown LiNbO8 single crystals.展开更多
文摘应用生长界面标记技术,标记不同调制电流密度通过固—液界面生长的区域,用离子探针测量各区域中溶质 Y 的相对浓度,得到在±7mAcm^(-2)的调制电流密度范围内,Y 的相对浓度与调制电流密度成正比。并研究了二个不同周期的交变的调制电流或一个给定周期的调制电流和一个温度波动同时引入生界面对溶质 Y 分凝影响,观察到二种不同周期的波动在生长界面耦合形成的复杂调制结构的生长层。
文摘In melt growth there are facetted and non-facetted growth sections, and longrange strain fields associated with the boundaries of two sections have been observed. In solution growth, similar phenomena have been observed near the boundaries between different growth prisms. In order to elucidate the origin of these long-range strain fields, we have studied the morphology of growth striae on the boundaries between facetted and non-facetted growth sections in Czochralski-grown LiNbO8 single crystals.