We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography（EBL） and a dry etch technique on a SiNx substrate,intended for large area manufacturing.To this end,the...We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography（EBL） and a dry etch technique on a SiNx substrate,intended for large area manufacturing.To this end,the highly sensitive chemically amplified resist（CAR）,NEB-22,with negative tone was used.The EBL process first defines the template pattern in NEB-22,which is then directly used as an etching mask in the subsequent reactive ion etching（RIE） on the SiNx to form the desired templates.The properties of both e-beam lithography and dry etch of NEB-22 were carefully studied,indicating significant advantages of this process with some drawbacks compared to when Cr was used as an etching mask.Nevertheless,our results open up a good opportunity to fabricate high resolution imprint templates with the prospect of wafer scale manufacturing.展开更多
基金supported by the National High Technology Research and Development Program of China(No.2006AA03Z352)the Science and Technology Commission of Shanghai (No. 08QH14002)+1 种基金the Seed Funding for Key Project by Ministry of Educationthe '985'Micro/Nanoelectronics Science and Technology Innovation Platform
文摘We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography（EBL） and a dry etch technique on a SiNx substrate,intended for large area manufacturing.To this end,the highly sensitive chemically amplified resist（CAR）,NEB-22,with negative tone was used.The EBL process first defines the template pattern in NEB-22,which is then directly used as an etching mask in the subsequent reactive ion etching（RIE） on the SiNx to form the desired templates.The properties of both e-beam lithography and dry etch of NEB-22 were carefully studied,indicating significant advantages of this process with some drawbacks compared to when Cr was used as an etching mask.Nevertheless,our results open up a good opportunity to fabricate high resolution imprint templates with the prospect of wafer scale manufacturing.
