期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
电荷俘获存储器界面缺陷生长模型及其可靠性模拟
1
作者 王泰寰 伦志远 +2 位作者 矫亦朋 刘晓彦 杜刚 《北京大学学报(自然科学版)》 EI CAS CSCD 北大核心 2014年第4期781-785,共5页
建立界面缺陷态密度随时间变化的模型。对电荷俘获存储器在不同应力条件下的可靠性进行模拟,为正常工作情形下,电荷俘获存储器内界面缺陷的生长机制以及不同应力条件下器件性能的退化提供预测工具。
关键词 电荷俘获存储器 可靠性模拟 界面缺陷
下载PDF
Comparison of band-to-band tunneling models in Si and Si–Ge junctions
2
作者 矫亦朋 魏康亮 +2 位作者 王泰寰 杜刚 刘晓彦 《Journal of Semiconductors》 EI CAS CSCD 2013年第9期6-10,共5页
We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si... We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si homo-junctions, different models could achieve similar results. However, in the Si-Ge hetero-junctions, there were significant differences among these models at high reverse biases (over 2 V). Compared to the nonlocal model, the local models in Sentaurus underrated the BTBT rate distinctly, and the Monte Carlo method was shown to give a better approximation. Additionally, it was found that in the Si region near the interface of the Si-Ge hetero-junctions, the direct tunneling rates increased largely due to the interaction of the band structures of Si and Ge. 展开更多
关键词 hetero-structure Monte Carlo device simulation carrier transport band-to-band tunneling
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部