Nowadays,the superior detection performance of semiconductor neutron detectors is a challenging task.In this paper,we deal with a novel GaN micro-structured neutron detector(GaN-MSND)and compare three different method...Nowadays,the superior detection performance of semiconductor neutron detectors is a challenging task.In this paper,we deal with a novel GaN micro-structured neutron detector(GaN-MSND)and compare three different methods such as the method of modulating the trench depth,the method of introducing dielectric layer and p-type inversion region to improve the width of depletion region(W).It is observed that the intensity of electric field can be modulated by scaling the trench depth.On the other hand,the electron blocking region is formed in the detector enveloped with a dielectric layer.Furthermore,the introducing of p-type inversion region produces new p/n junction,which not only promotes the further expansion of the depletion region but also reduces the intensity of electric field produced by main junction.It can be realized that all these methods can considerably enhance the working voltage as well as W.Of them,the improvement on W of GaN-MSND with the p-type inversion region is the most significant and the value of W could reach 12.8μm when the carrier concentration of p-type inversion region is 10^17 cm^-3.Consequently,the value of W is observed to improve 200%for the designed GaN-MSND as compared with that without additional design.This work ensures to the researchers and scientific community the fabrication of GaN-MSND having superior detection limit in the field of intense radiation.展开更多
本文制备了基于机械剥离β-Ga2O3的Ni/Au垂直结构肖特基器件,对该器件进行了温度特性I-V曲线测试.器件表现出了良好的二极管特性,随着温度从300 K升高至473 K,势垒高度从1.08 e V上升至1.35 e V,理想因子从1.32降低至1.19,二者表现出了...本文制备了基于机械剥离β-Ga2O3的Ni/Au垂直结构肖特基器件,对该器件进行了温度特性I-V曲线测试.器件表现出了良好的二极管特性,随着温度从300 K升高至473 K,势垒高度从1.08 e V上升至1.35 e V,理想因子从1.32降低至1.19,二者表现出了较强的温度依赖特性,这表明器件的肖特基势垒存在势垒高度不均匀的问题.串联电阻随温度升高而降低,这主要是热激发载流子浓度升高导致的.本文利用势垒高度的高斯分布对器件的温度特性进行了修正,修正后的势垒高度为1.54 e V,理查孙常数为26.35 A·cm–2·K–2,更接近理论值,这表明利用高斯分布势垒高度的热电子发射模型能够很好地解释Au/Ni/β-Ga2O3肖特基二极管的I-V温度特性问题,这种方法更适合用来测量β-Ga2O3肖特基二极管的电学参数.展开更多
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11675198,11875097,11975257,61774072,61574026,and 61971090)the National Key Research and Development Program of China(Grant Nos.2016YFB0400600 and2016YFB0400601)+2 种基金the Fundamental Research Funds for the Central Universities,China(Grant No.DUT19LK45)the China Postdoctoral Science Foundation(Grant No.2016M591434)the Science and Technology Plan of Dalian City,China(Grant No.2018J12GX060).
文摘Nowadays,the superior detection performance of semiconductor neutron detectors is a challenging task.In this paper,we deal with a novel GaN micro-structured neutron detector(GaN-MSND)and compare three different methods such as the method of modulating the trench depth,the method of introducing dielectric layer and p-type inversion region to improve the width of depletion region(W).It is observed that the intensity of electric field can be modulated by scaling the trench depth.On the other hand,the electron blocking region is formed in the detector enveloped with a dielectric layer.Furthermore,the introducing of p-type inversion region produces new p/n junction,which not only promotes the further expansion of the depletion region but also reduces the intensity of electric field produced by main junction.It can be realized that all these methods can considerably enhance the working voltage as well as W.Of them,the improvement on W of GaN-MSND with the p-type inversion region is the most significant and the value of W could reach 12.8μm when the carrier concentration of p-type inversion region is 10^17 cm^-3.Consequently,the value of W is observed to improve 200%for the designed GaN-MSND as compared with that without additional design.This work ensures to the researchers and scientific community the fabrication of GaN-MSND having superior detection limit in the field of intense radiation.
文摘本文制备了基于机械剥离β-Ga2O3的Ni/Au垂直结构肖特基器件,对该器件进行了温度特性I-V曲线测试.器件表现出了良好的二极管特性,随着温度从300 K升高至473 K,势垒高度从1.08 e V上升至1.35 e V,理想因子从1.32降低至1.19,二者表现出了较强的温度依赖特性,这表明器件的肖特基势垒存在势垒高度不均匀的问题.串联电阻随温度升高而降低,这主要是热激发载流子浓度升高导致的.本文利用势垒高度的高斯分布对器件的温度特性进行了修正,修正后的势垒高度为1.54 e V,理查孙常数为26.35 A·cm–2·K–2,更接近理论值,这表明利用高斯分布势垒高度的热电子发射模型能够很好地解释Au/Ni/β-Ga2O3肖特基二极管的I-V温度特性问题,这种方法更适合用来测量β-Ga2O3肖特基二极管的电学参数.
