ZnO nanowall networks were prepared by plasma-assisted molecular beam epitaxy without a catalyst on Si（111） substrates.The nanostructures have preferred orientation along the c axis.The nanostructures are about 10 t...ZnO nanowall networks were prepared by plasma-assisted molecular beam epitaxy without a catalyst on Si（111） substrates.The nanostructures have preferred orientation along the c axis.The nanostructures are about 10 to 20 nm thick and about 50 nm tall.The planar geometry photoconductive type metal-semiconductor-metal photodetector based on the ZnO nanowall networks exhibits a high and wide response spectrum,and no decrease from 250 to 360 nm.With the applied bias below 5 V,the dark current was below 6μA,and the peak responsivity of 15 A/W was achieved at 360 nm.The UV（360 nm） to visible（450 nm） rejection ratio of around two orders could be extracted from the spectra response.展开更多
基金Project supported by the Grow Seedlings Project of Guangdong Province,China(No.LYM 10063)
文摘ZnO nanowall networks were prepared by plasma-assisted molecular beam epitaxy without a catalyst on Si（111） substrates.The nanostructures have preferred orientation along the c axis.The nanostructures are about 10 to 20 nm thick and about 50 nm tall.The planar geometry photoconductive type metal-semiconductor-metal photodetector based on the ZnO nanowall networks exhibits a high and wide response spectrum,and no decrease from 250 to 360 nm.With the applied bias below 5 V,the dark current was below 6μA,and the peak responsivity of 15 A/W was achieved at 360 nm.The UV（360 nm） to visible（450 nm） rejection ratio of around two orders could be extracted from the spectra response.
