We develop a picosecond widely tunable laser in a deep-ultraviolet region from 175 nm to 210 nm, generated by two stages of frequency doubling of a 80-MHz mode-locked picosecond Ti：sapphire laser. A β-BaB2O4 walk-of...We develop a picosecond widely tunable laser in a deep-ultraviolet region from 175 nm to 210 nm, generated by two stages of frequency doubling of a 80-MHz mode-locked picosecond Ti：sapphire laser. A β-BaB2O4 walk-off compensation configuration and a KBe2BO3F2 prism-coupled device are adopted for the generation of second harmonic and fourth harmonics, respectively. The highest power is 3.72 mW at 193 nm, and the fluctuation at 2.85 mW in 130 rain is less than ±2%.展开更多
We report on a polarization-adjustable picosecond deep-ultraviolet (DUV) laser at 177.3 nm.The DUV laser was produced by second harmonic generation from a mode-locked laser at 355 nm in nonlinear optical crystal KBBF....We report on a polarization-adjustable picosecond deep-ultraviolet (DUV) laser at 177.3 nm.The DUV laser was produced by second harmonic generation from a mode-locked laser at 355 nm in nonlinear optical crystal KBBF.The laser delivered a maximum average output power of 1.1 m W at 177.3 nm.The polarization of the 177.3nm beam was adjusted with linear and circular polarization by means of λ/4 and λ/2 wave plates.To the best of our knowledge,the laser has been employed as the circularly polarized and linearly polarized DUV light source for a spin- and angle-resolved photoemission spectroscopy with high resolution for the first time.展开更多
基金supported by the State Key Program for Basic Research of China (Grant No. 2010CB630706)National High Technology Research and Development Program of Chinathe National Natural Science Foundation of China (Grant No. 61138004)
文摘We develop a picosecond widely tunable laser in a deep-ultraviolet region from 175 nm to 210 nm, generated by two stages of frequency doubling of a 80-MHz mode-locked picosecond Ti：sapphire laser. A β-BaB2O4 walk-off compensation configuration and a KBe2BO3F2 prism-coupled device are adopted for the generation of second harmonic and fourth harmonics, respectively. The highest power is 3.72 mW at 193 nm, and the fluctuation at 2.85 mW in 130 rain is less than ±2%.
基金Supported by the National Basic Research Program of China under Grant No 2010CB630706the National High-Technology Research and Development Program of Chinathe National Natural Science Foundation of China,and the Knowledge Innovation Program of Chinese Academy of Sciences.
文摘We report on a polarization-adjustable picosecond deep-ultraviolet (DUV) laser at 177.3 nm.The DUV laser was produced by second harmonic generation from a mode-locked laser at 355 nm in nonlinear optical crystal KBBF.The laser delivered a maximum average output power of 1.1 m W at 177.3 nm.The polarization of the 177.3nm beam was adjusted with linear and circular polarization by means of λ/4 and λ/2 wave plates.To the best of our knowledge,the laser has been employed as the circularly polarized and linearly polarized DUV light source for a spin- and angle-resolved photoemission spectroscopy with high resolution for the first time.
