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基于双电荷层结构的CMOS单光子雪崩二极管
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作者 许明珠 张钰 +2 位作者 夏翠雲 逯鑫淼 徐江涛 《光子学报》 EI CAS CSCD 北大核心 2019年第7期35-41,共7页
基于180nm标准CMOS工艺,设计了一种能够有效提高光子探测效率的双电荷层结构的单光子雪崩二极管.该器件结构采用P电荷层和逆行掺杂的深N阱形成PN结,选取不同的P电荷层掺杂浓度,对击穿电压进行优化,当P电荷层浓度为1×10^18cm^-3时,... 基于180nm标准CMOS工艺,设计了一种能够有效提高光子探测效率的双电荷层结构的单光子雪崩二极管.该器件结构采用P电荷层和逆行掺杂的深N阱形成PN结,选取不同的P电荷层掺杂浓度,对击穿电压进行优化,当P电荷层浓度为1×10^18cm^-3时,击穿电压为17.8V,电场强度为5.26×10^5V/cm.进一步研究发现N电荷层的位置会影响漂移电流密度和扩散电流密度.当在深N阱与N隔离层交界处掺杂形成N电荷层,即N电荷层掺杂峰值距离器件表面为2.5μm时,器件性能最优.通过SilvacoTCAD仿真分析得到:在过偏压1V下,波长500nm处的探测效率峰值为62%,同时在300~700nm范围内的光子探测效率均大于30%. 展开更多
关键词 光电探测器 单光子雪崩二极管 180nm标准CMOS工艺 双电荷层 击穿电压 光谱响应 光子探测效率
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Modeling random telegraph signal noise in CMOS image sensor under low light based on binomial distribution 被引量:1
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作者 张钰 逯鑫淼 +2 位作者 王光义 胡永才 徐江涛 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第7期164-170,共7页
The random telegraph signal noise in the pixel source follower MOSFET is the principle component of the noise in the CMOS image sensor under low light. In this paper, the physical and statistical model of the random t... The random telegraph signal noise in the pixel source follower MOSFET is the principle component of the noise in the CMOS image sensor under low light. In this paper, the physical and statistical model of the random telegraph signal noise in the pixel source follower based on the binomial distribution is set up. The number of electrons captured or released by the oxide traps in the unit time is described as the random variables which obey the binomial distribution. As a result,the output states and the corresponding probabilities of the first and the second samples of the correlated double sampling circuit are acquired. The standard deviation of the output states after the correlated double sampling circuit can be obtained accordingly. In the simulation section, one hundred thousand samples of the source follower MOSFET have been simulated,and the simulation results show that the proposed model has the similar statistical characteristics with the existing models under the effect of the channel length and the density of the oxide trap. Moreover, the noise histogram of the proposed model has been evaluated at different environmental temperatures. 展开更多
关键词 random telegraph signal noise physical and statistical model binomial distribution CMOS image sensor
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Dark count in single-photon avalanche diodes:A novel statistical behavioral model
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作者 喻文娟 张钰 +1 位作者 许明珠 逯鑫淼 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第4期523-529,共7页
Dark count is one of the inherent noise types in single-photon diodes,which may restrict the performances of detectors based on these diodes.To formulate better designs for peripheral circuits of such diodes,an accura... Dark count is one of the inherent noise types in single-photon diodes,which may restrict the performances of detectors based on these diodes.To formulate better designs for peripheral circuits of such diodes,an accurate statistical behavioral model of dark current must be established.Research has shown that there are four main mechanisms that contribute to the dark count in single-photon avalanche diodes.However,in the existing dark count models only three models have been considered,thus leading to inaccuracies in these models.To resolve these shortcomings,the dark current caused by carrier diffusion in the neutral region is deduced by multiplying the carrier detection probability with the carrier particle current at the boundary of the depletion layer.Thus,a comprehensive dark current model is constructed by adding the dark current caused by carrier diffusion to the dark current caused by the other three mechanisms.To the best of our knowledge,this is the first dark count simulation model into which incorporated simultaneously are the thermal generation,trap-assisted tunneling,band-to-band tunneling mechanisms,and carrier diffusion in neutral regions to evaluate dark count behavior.The comparison between the measured data and the simulation results from the models shows that the proposed model is more accurate than other existing models,and the maximum of accuracy increases up to 31.48%when excess bias voltage equals 3.5 V and temperature is 50℃. 展开更多
关键词 SINGLE-PHOTON AVALANCHE diode DARK COUNT STATISTICAL BEHAVIORAL modeling carrier diffusion
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近红外波段锑基铋掺杂薄膜厚度对光学常数与光学带隙的影响 被引量:2
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作者 逯鑫淼 姜来新 +1 位作者 吴谊群 王阳 《光学学报》 EI CAS CSCD 北大核心 2012年第11期324-328,共5页
采用磁控溅射法制备了不同厚度的锑基铋掺杂薄膜,用X射线衍射(XRD)和透射电子显微镜(TEM)研究了薄膜结构随厚度的变化。利用椭圆偏振法测定了样品薄膜在近红外波段的光学常数与光学带隙,研究了膜厚对样品薄膜光学常数和光学带隙的影响... 采用磁控溅射法制备了不同厚度的锑基铋掺杂薄膜,用X射线衍射(XRD)和透射电子显微镜(TEM)研究了薄膜结构随厚度的变化。利用椭圆偏振法测定了样品薄膜在近红外波段的光学常数与光学带隙,研究了膜厚对样品薄膜光学常数和光学带隙的影响。结果表明,膜厚从7nm增加至100nm时,其结构由非晶态转变为晶态。在950~2200nm波段,不同厚度薄膜样品的折射率在4.6~8.9范围,消光系数在0.6~5.8范围,光学带隙在0.32~0.16eV范围。随着膜厚的增加,薄膜的折射率和光学带隙减小,而消光系数升高;光学常数在膜厚50nm时存在临界值,其原因是临界值前后薄膜微观结构变化不同。 展开更多
关键词 薄膜 光学常数 膜厚 锑基铋掺杂薄膜 近红外波段
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锑铋合金薄膜的光学常数 被引量:3
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作者 姜来新 逯鑫淼 +1 位作者 王阳 吴谊群 《中国激光》 EI CAS CSCD 北大核心 2012年第9期124-130,共7页
锑铋合金薄膜是一种新型超分辨光学功能材料,了解它的基本光学性质对其在光学信息存储及光子器件应用方面具有重要意义。用磁控溅射法制备了不同成分的锑铋合金薄膜(Sb1-XBiX,X=0,0.1,0.2,0.3,0.88,1),用椭圆偏振法测量了薄膜的光学常数... 锑铋合金薄膜是一种新型超分辨光学功能材料,了解它的基本光学性质对其在光学信息存储及光子器件应用方面具有重要意义。用磁控溅射法制备了不同成分的锑铋合金薄膜(Sb1-XBiX,X=0,0.1,0.2,0.3,0.88,1),用椭圆偏振法测量了薄膜的光学常数(折射率n和消光系数k)。研究表明,在可见光波段(300~850nm),锑铋合金膜的折射率和消光系数都随着铋含量的增加而减小,且薄膜折射率和消光系数同时随波长的增加而增加,折射率呈现反常色散特性。用原子力显微镜、X射线衍射仪研究了成分变化对薄膜表面形貌和微结构的影响。研究表明,锑铋合金薄膜的微观结构呈现多晶态,晶化程度随着铋含量的增加而增加,这可能是影响其光学常数变化的主要因素。 展开更多
关键词 薄膜 锑铋合金 光学常数 磁控溅射
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