利用Kr F准分子激光器晶化非晶硅薄膜,研究了不同的激光能量密度和脉冲次数对非晶硅薄膜晶化效果的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对晶化前后的样品的物相结构和表面形貌进行了表征和分析。实验结果表明,在激光频率为1...利用Kr F准分子激光器晶化非晶硅薄膜,研究了不同的激光能量密度和脉冲次数对非晶硅薄膜晶化效果的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对晶化前后的样品的物相结构和表面形貌进行了表征和分析。实验结果表明,在激光频率为1 Hz的条件下,能量密度约为180 m J/cm2时,准分子激光退火处理实现了薄膜由非晶结构向多晶结构的转变;当大于晶化阈值180 m J/cm2小于能量密度230 m J/cm2时,随着激光能量密度增大,薄膜晶化效果越来越好;激光能量密度为230 m J/cm2时,晶化效果最好、晶粒尺寸最大,约60 nm,并且此时薄膜沿Si(111)面择优生长;脉冲次数50次以后对晶化的影响不大。展开更多
基金supported by the National Key Basic Research Program of China (973) (2011CBA00700)National High Technology Research and Development Program of China (863) (2011AA050527)National Natural Science Foundation of China (51172237, 61306082, 61306083)~~
文摘利用Kr F准分子激光器晶化非晶硅薄膜,研究了不同的激光能量密度和脉冲次数对非晶硅薄膜晶化效果的影响。利用X射线衍射(XRD)和扫描电子显微镜(SEM)对晶化前后的样品的物相结构和表面形貌进行了表征和分析。实验结果表明,在激光频率为1 Hz的条件下,能量密度约为180 m J/cm2时,准分子激光退火处理实现了薄膜由非晶结构向多晶结构的转变;当大于晶化阈值180 m J/cm2小于能量密度230 m J/cm2时,随着激光能量密度增大,薄膜晶化效果越来越好;激光能量密度为230 m J/cm2时,晶化效果最好、晶粒尺寸最大,约60 nm,并且此时薄膜沿Si(111)面择优生长;脉冲次数50次以后对晶化的影响不大。
基金National Natural Science Foundation of China(51172237)National Basic Research Program of China(2011CBA00700)+2 种基金National High Technology Research and Development Program of China(2011AA050527)Anhui Provincial International Science and Technology Cooperation Program(10080703021)Knowledge Innovation Program of the Chinese Academy ofSciences
基金jointly supported by the National Natural Science Foundation of China(No.62075223 and No.11674324)CAS Pioneer Hundred Talents Program of Chinese Academy of Sciences+5 种基金CAS-JSPS Joint Research Projects(GJHZ1891)Director Fund of Advanced Laser Technology Laboratory of Anhui Province(AHL2020ZR02)Key Lab of Photovoltaic and Energy Conservation Materials of Chinese Academy of Sciences(PECL2019QN005 and PECL2018QN001)the Natural Science Foundation of Top Talent of Shenzhen Technology University(No.2020101)Natural Science Research Project of Higher School of Anhui Province(KJ2020A0477)Initial Scientific Research Fund of Anhui Jianzhu University(No.2018QD60)。