一、引言 场助Ⅲ—Ⅴ族多元化合物半导体光电阴极与GaAs NEA(Negative electron affinity)光电阴极相比,具有可延伸光电探测的长波阈值、提高红外波段光谱灵敏度等优点,因此在光纤通信、微光夜视以及高速摄影等方面具有广泛的应用。虽...一、引言 场助Ⅲ—Ⅴ族多元化合物半导体光电阴极与GaAs NEA(Negative electron affinity)光电阴极相比,具有可延伸光电探测的长波阈值、提高红外波段光谱灵敏度等优点,因此在光纤通信、微光夜视以及高速摄影等方面具有广泛的应用。虽然目前场助多元化合物半导体光电阴极的研究已取得了许多成果,但有关理论研究方面的报道却很少见。展开更多
Different processes are used on the back surface of silicon wafers to form cells falling into three groups：textured, planar, and sawed-off pyramid back surface.The characteristic parameters of the cells, ISC, VOC, FF...Different processes are used on the back surface of silicon wafers to form cells falling into three groups：textured, planar, and sawed-off pyramid back surface.The characteristic parameters of the cells, ISC, VOC, FF, Pm, and Eff, are measured.All these parameters of the planar back surface cells are the best.The FF, Pm, and Eff of sawed-off pyramid back surface cells are superior to textured back surface cells, although ISC and VOC are lower.The parasitic resistance is analyzed to explain the higher FF of the sawed-off pyramid back surface cells.The cross-section scanning electron microscopy（SEM） pictures show the uniformity of the aluminum-silicon alloy, which has an important effect on the back surface recombination velocity and the ohmic contact.The measured value of the aluminum back surface field thickness in the SEM picture is in good agreement with the theoretical value deduced from the Al-Si phase diagram.It is shown in an external quantum efficiency（EQE） diagram that the planar back surface has the best response to a wavelength between 440 and 1000 nm and the sawed-off back surface has a better long wavelength response.展开更多
Ⅰ. INTRODUCTION The field-assisted Ⅲ-Ⅴ semiconductor photocathodes as compared with the GaAs NEA (NEA-Negative Electron Affinity)photocathodes have the advantages of extensible long-wavelength threshold for photoel...Ⅰ. INTRODUCTION The field-assisted Ⅲ-Ⅴ semiconductor photocathodes as compared with the GaAs NEA (NEA-Negative Electron Affinity)photocathodes have the advantages of extensible long-wavelength threshold for photoelectric detection and increasing the spectral展开更多
文摘一、引言 场助Ⅲ—Ⅴ族多元化合物半导体光电阴极与GaAs NEA(Negative electron affinity)光电阴极相比,具有可延伸光电探测的长波阈值、提高红外波段光谱灵敏度等优点,因此在光纤通信、微光夜视以及高速摄影等方面具有广泛的应用。虽然目前场助多元化合物半导体光电阴极的研究已取得了许多成果,但有关理论研究方面的报道却很少见。
文摘Different processes are used on the back surface of silicon wafers to form cells falling into three groups：textured, planar, and sawed-off pyramid back surface.The characteristic parameters of the cells, ISC, VOC, FF, Pm, and Eff, are measured.All these parameters of the planar back surface cells are the best.The FF, Pm, and Eff of sawed-off pyramid back surface cells are superior to textured back surface cells, although ISC and VOC are lower.The parasitic resistance is analyzed to explain the higher FF of the sawed-off pyramid back surface cells.The cross-section scanning electron microscopy（SEM） pictures show the uniformity of the aluminum-silicon alloy, which has an important effect on the back surface recombination velocity and the ohmic contact.The measured value of the aluminum back surface field thickness in the SEM picture is in good agreement with the theoretical value deduced from the Al-Si phase diagram.It is shown in an external quantum efficiency（EQE） diagram that the planar back surface has the best response to a wavelength between 440 and 1000 nm and the sawed-off back surface has a better long wavelength response.
文摘Ⅰ. INTRODUCTION The field-assisted Ⅲ-Ⅴ semiconductor photocathodes as compared with the GaAs NEA (NEA-Negative Electron Affinity)photocathodes have the advantages of extensible long-wavelength threshold for photoelectric detection and increasing the spectral
