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热丝助进氢等离子体中电子及活性粒子输运过程的蒙特卡罗模拟
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作者 陈牧笛 周曙 《西北大学学报(自然科学版)》 CAS CSCD 北大核心 2009年第6期974-977,共4页
目的研究热阴极直流放电氢等离子体中电子及活性粒子输运过程。方法Monte Carlo模拟方法。结果建立了电子及活性粒子在氢等离子体辉光放电中的输运模型,得到了荷能粒子在放电空间的能量分布,空间分布以及发生各种化学反应的频率分布。... 目的研究热阴极直流放电氢等离子体中电子及活性粒子输运过程。方法Monte Carlo模拟方法。结果建立了电子及活性粒子在氢等离子体辉光放电中的输运模型,得到了荷能粒子在放电空间的能量分布,空间分布以及发生各种化学反应的频率分布。结论模拟结果与有关文献报道的实验结果对比,取得了较好的一致性,可利用于更多有氢等离子体参与的实验研究。 展开更多
关键词 MONTE CARLO模拟 氢等离子体 输运过程
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Formation of SiC Nanostruture Using Hexamethyldisiloxane During Plasma-Assisted Hot-Filament Chemical Vapor Deposition
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作者 陈牧笛 朱晓东 +3 位作者 柯博 丁芳 温晓辉 周海洋 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第5期547-550,共4页
Growth of SiC nanowires in plasma-assisted hot filament chemical-vapor-deposition by using hexamethyldisiloxane (HMDSO) as the gas source is reported. The SiC nanowires (SIC NWs) grew on Au-coated silicon substrat... Growth of SiC nanowires in plasma-assisted hot filament chemical-vapor-deposition by using hexamethyldisiloxane (HMDSO) as the gas source is reported. The SiC nanowires (SIC NWs) grew on Au-coated silicon substrate with core-shell structure, where the core consisted of polycrystalline SiC grains and the shell exhibited amorphous structure. The featured structures such as cones, polyhedrons, ball-liked particles were observed in the case without plasma assistance. The underlying mechanism for the growth of nanostructures was also discussed. The high chemical activity induced by the plasma process plays an important role in using monomer to generate nanostructure. 展开更多
关键词 SIC NANOWIRES plasma
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Effect of Krypton Addition on Electron Cyclotron Resonance-Radio Frequency Hybrid Oxygen Plasma for Patterning Diamond Surfaces
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作者 汪磊 王鸿勇 +4 位作者 柯博 丁芳 陈牧笛 周海洋 朱晓东 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期31-34,共4页
Electron cyclotron resonance radio frequency (ECR-rf) hybrid krypton-diluted oxygen plasmas were used to pattern the surfaces of diamond films with the assistance of a physical mask, while optical emission spectrosc... Electron cyclotron resonance radio frequency (ECR-rf) hybrid krypton-diluted oxygen plasmas were used to pattern the surfaces of diamond films with the assistance of a physical mask, while optical emission spectroscopy was employed to characterize the plasma. It was found that with krypton dilution the etching rate decreased, and also the aspect ratios of nanotips formed in micro-holes were significantly modified. The oxygen atomic densities were estimated by oxygen atom optical emission and argon actinometry. Under a microwave power of 300 W and rf bias of-300 V, the absolute density of ground-state oxygen atoms decreased from 1.3×10^12 cm^-3 to 1.4×10^11 cm^-3 as the krypton dilution ratio increased to 80%, accompanied by the decrease in the plasma excitation temperature. It is concluded that oxygen atoms play a dominant role in diamond etching. The relative variations in the horizontal and vertical etching rates induced by the addition of krypton are attributed to the observations of thicker nanotips at a high krypton dilution ratio. 展开更多
关键词 diamond etching oxygen/krypton plasma surface
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电子回旋共振-射频双等离子体沉积氧化硅薄膜过程中的射频偏压效应 被引量:1
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作者 柯博 汪磊 +5 位作者 倪添灵 丁芳 陈牧笛 周海洋 温晓辉 朱晓东 《物理学报》 SCIE EI CAS CSCD 北大核心 2010年第2期1338-1343,共6页
本文利用六甲基乙硅氧烷(HMDSO)和氧气(O2)为反应气体,利用微波电子回旋共振-射频双等离子体化学气相沉积法沉积氧化硅薄膜,并利用发射光谱对等离子体特性进行原位诊断.研究表明,RF偏压对氧化硅薄膜沉积速率和薄膜中的化学键结构产生有... 本文利用六甲基乙硅氧烷(HMDSO)和氧气(O2)为反应气体,利用微波电子回旋共振-射频双等离子体化学气相沉积法沉积氧化硅薄膜,并利用发射光谱对等离子体特性进行原位诊断.研究表明,RF偏压对氧化硅薄膜沉积速率和薄膜中的化学键结构产生有意义的影响.小的直流自偏压会略微提高沉积速率;但随着直流自偏压的增加,离子轰击效应及刻蚀作用加强,薄膜的沉积速率下降.在13.56MHz和400kHz两个不同射频频率条件下所沉积的薄膜中,O和Si的比例基本相同,均超过2∶1;但400kHz射频偏压下薄膜中的碳成分比例比13.56MHz条件下的要高得多.这可以归因为高的射频偏压的应用不仅可增强离子轰击效应,而且与体等离子体相互作用,使高活性的氧原子增多;而低频偏压的作用主要是增强离子轰击效应. 展开更多
关键词 电子回旋共振-射频双等离子体 射频偏压 氧化硅薄膜
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