In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona dischar...In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona discharge monitoring.So far,common self-powered UV PDs are mainly based on metal-semiconductor heterostructures or p–n heterojunctions,where the limited intrinsic built-in electric field restricts further enhancement of the photoresponsivity.In this work,an extremely low-voltage field-effect UV PD is proposed using a gatedrain shorted amorphous IGZO(a-IGZO)thin film transistor(TFT)architecture.A combined investigation of the experimental measurements and technology computer-aided design(TCAD)simulations suggests that the reverse current(ⅠR)of field-effect diode(FED)is highly related with the threshold voltage(Vth)of the parental TFT,implying an enhancement-mode TFT is preferable to fabricate the field-effect UV PD with low dark current.Driven by a low bias of-0.1 V,decent UV response has been realized including large UV/visible(R_(300)/R_(550))rejection ratio(1.9×10^(3)),low dark current(1.15×10^(-12)A)as well as high photo-to-dark current ratio(PDCR,~10^(3))and responsivity(1.89 A/W).This field-effect photodiode provides a new platform to construct UV PDs with well-balanced photoresponse performance at a low bias,which is attractive for designs of large-scale smart sensor networks with high energy efficiency.展开更多
Dual-active-layer(DAL)amorphous InGaZnO(IGZO)thin-film transistors(TFTs)are fabricated at low temperature without post-annealing.A bottom low-resistance(low-R)IGZO layer and a top high-resistance(high-R)IGZO layer con...Dual-active-layer(DAL)amorphous InGaZnO(IGZO)thin-film transistors(TFTs)are fabricated at low temperature without post-annealing.A bottom low-resistance(low-R)IGZO layer and a top high-resistance(high-R)IGZO layer constitute the DAL homojunction with smooth and high-quality interface by in situ modulation of oxygen composition.The performance of the DAL TFT is significantly improved when compared to that of a single-active-layer TFT.A detailed investigation was carried out regarding the effects of the thickness of both layers on the electrical properties and gate bias stress stabilities.It is found that the low-R layer improves the mobility,ON/OFF ratio,threshold voltage and hysteresis voltage by passivating the defects and providing a smooth interface.The high-R IGZO layer has a great impact on the hysteresis,which changes from clockwise to counterclockwise.The best TFT shows a mobility of 5.41 cm^2/V·s,a subthreshold swing of 95.0 mV/dec,an ON/OFF ratio of 6.70×10^7,a threshold voltage of 0.24 V,and a hysteresis voltage of 0.13 V.The value of threshold voltage shifts under positive gate bias stress decreases when increasing the thickness of both layers.展开更多
In the present work, we explore the solar-blind ultraviolet（UV） photodetectors（PDs） with enhanced photoresponse,fabricated on Ga/Ga2O3 nanocomposite films. Through pre-burying metal Ga layers and thermally post-an...In the present work, we explore the solar-blind ultraviolet（UV） photodetectors（PDs） with enhanced photoresponse,fabricated on Ga/Ga2O3 nanocomposite films. Through pre-burying metal Ga layers and thermally post-annealing the laminated Ga2 O3/Ga/Ga2O3 structures, Ga/Ga2O3 nanocomposite films incorporated with Ga nanospheres are obtained. For the prototype PD, it is found that the photocurrent and photoresponsivity will first increase and then decrease monotonically with the thickness of the pre-buried Ga layer increasing. Each of all PDs shows a spectrum response peak at 260 nm, demonstrating the ability to detect solar-blind UV light. Adjustable photoresponse enhancement factors are achieved by means of the surface plasmon in the nanocomposite films. The PD with a 20 nm thick Ga interlayer exhibits the best solar-blind UV photoresponse characteristics with an extremely low dark current of 8.52 p A at 10-V bias, a very high light-to-dark ratio of ～ 8 × 10~5, a large photoresponsivity of 2.85 A/W at 15-V bias, and a maximum enhancement factor of ～ 220. Our research provides a simple and practical route to high performance solar-blind UV PDs and potential applications in the field of optoelectronics.展开更多
Direct ZnO x-ray detectors with tunable sensitivity are realized by delicately controlling the oxygen flux during the sputtering deposition process. The photocurrents induced by x-rays from a 40 kV x-ray tube with a C...Direct ZnO x-ray detectors with tunable sensitivity are realized by delicately controlling the oxygen flux during the sputtering deposition process. The photocurrents induced by x-rays from a 40 kV x-ray tube with a Cu anode increase apparently as the oxygen flux decreases, which is attributed to the introduction of Vo detects.By introducing Vo defects, the annihilation rate of the photo-generated electron-hole pairs will be greatly slowed down, leading to a remarkable photoconductive gain. This finding informs a novel way to design the x-ray detectors based on abundant oxide materials.展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.62174113,12174275,and 61874139)the Guangdong Basic and Applied Basic Research Foundation(Grant Nos.2019B1515120057,2023A1515140094,and 2023A1515110730)。
文摘In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona discharge monitoring.So far,common self-powered UV PDs are mainly based on metal-semiconductor heterostructures or p–n heterojunctions,where the limited intrinsic built-in electric field restricts further enhancement of the photoresponsivity.In this work,an extremely low-voltage field-effect UV PD is proposed using a gatedrain shorted amorphous IGZO(a-IGZO)thin film transistor(TFT)architecture.A combined investigation of the experimental measurements and technology computer-aided design(TCAD)simulations suggests that the reverse current(ⅠR)of field-effect diode(FED)is highly related with the threshold voltage(Vth)of the parental TFT,implying an enhancement-mode TFT is preferable to fabricate the field-effect UV PD with low dark current.Driven by a low bias of-0.1 V,decent UV response has been realized including large UV/visible(R_(300)/R_(550))rejection ratio(1.9×10^(3)),low dark current(1.15×10^(-12)A)as well as high photo-to-dark current ratio(PDCR,~10^(3))and responsivity(1.89 A/W).This field-effect photodiode provides a new platform to construct UV PDs with well-balanced photoresponse performance at a low bias,which is attractive for designs of large-scale smart sensor networks with high energy efficiency.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11674405,61874139,and 11675280)
文摘Dual-active-layer(DAL)amorphous InGaZnO(IGZO)thin-film transistors(TFTs)are fabricated at low temperature without post-annealing.A bottom low-resistance(low-R)IGZO layer and a top high-resistance(high-R)IGZO layer constitute the DAL homojunction with smooth and high-quality interface by in situ modulation of oxygen composition.The performance of the DAL TFT is significantly improved when compared to that of a single-active-layer TFT.A detailed investigation was carried out regarding the effects of the thickness of both layers on the electrical properties and gate bias stress stabilities.It is found that the low-R layer improves the mobility,ON/OFF ratio,threshold voltage and hysteresis voltage by passivating the defects and providing a smooth interface.The high-R IGZO layer has a great impact on the hysteresis,which changes from clockwise to counterclockwise.The best TFT shows a mobility of 5.41 cm^2/V·s,a subthreshold swing of 95.0 mV/dec,an ON/OFF ratio of 6.70×10^7,a threshold voltage of 0.24 V,and a hysteresis voltage of 0.13 V.The value of threshold voltage shifts under positive gate bias stress decreases when increasing the thickness of both layers.
基金supported by the National Natural Science Foundation of China(Grant Nos.11674405 and 11675280)the Fund from the Laboratory of Microfabrication in Institute of Physics,Chinese Academy of Sciences
文摘In the present work, we explore the solar-blind ultraviolet（UV） photodetectors（PDs） with enhanced photoresponse,fabricated on Ga/Ga2O3 nanocomposite films. Through pre-burying metal Ga layers and thermally post-annealing the laminated Ga2 O3/Ga/Ga2O3 structures, Ga/Ga2O3 nanocomposite films incorporated with Ga nanospheres are obtained. For the prototype PD, it is found that the photocurrent and photoresponsivity will first increase and then decrease monotonically with the thickness of the pre-buried Ga layer increasing. Each of all PDs shows a spectrum response peak at 260 nm, demonstrating the ability to detect solar-blind UV light. Adjustable photoresponse enhancement factors are achieved by means of the surface plasmon in the nanocomposite films. The PD with a 20 nm thick Ga interlayer exhibits the best solar-blind UV photoresponse characteristics with an extremely low dark current of 8.52 p A at 10-V bias, a very high light-to-dark ratio of ～ 8 × 10~5, a large photoresponsivity of 2.85 A/W at 15-V bias, and a maximum enhancement factor of ～ 220. Our research provides a simple and practical route to high performance solar-blind UV PDs and potential applications in the field of optoelectronics.
基金Supported by the National Natural Science Foundation of China under Grant Nos 11675280,11674405,61874139 and 11875088
文摘Direct ZnO x-ray detectors with tunable sensitivity are realized by delicately controlling the oxygen flux during the sputtering deposition process. The photocurrents induced by x-rays from a 40 kV x-ray tube with a Cu anode increase apparently as the oxygen flux decreases, which is attributed to the introduction of Vo detects.By introducing Vo defects, the annihilation rate of the photo-generated electron-hole pairs will be greatly slowed down, leading to a remarkable photoconductive gain. This finding informs a novel way to design the x-ray detectors based on abundant oxide materials.
