Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M N...Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M NaOH＋0.066M Na2SiO3＋0.008M （NAPO3）6]. The voltage-time responses show that the PEO process of E2 has the highest discharging voltage, which results in the biggest pores and heaviest cracks on the surfaces. X-ray diffraction results show that coatings produced in E1 and E3 are mainly composed of γ-Al2O3 and mullite, while coatings produced in E2 are mainly composed of a-Al2O3. After PEO treatment the corrosion resistance of aluminium is improved significantly and the coatings produced in E3 perform the best corrosion resistance.展开更多
A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated b...A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated by an electric coil around the tube sample, glow arc plasma moves spirally into the tube from its two ends. A negative voltage applied on the tube realized its inner surface implantation. Titanium nitride （TIN） films are prepared on the inner surface of a stainless steel tube in diameter 90mm and length 600mm. Hardness tests show that the hardness at the tube centre is up to 20 GPa. XRD, XPS and AES analyses demonstrate that good quality of TiN films can be achieved.展开更多
Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morpholo...Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morphology of the films are characterized by x-ray diffraction （XRD）, x-ray photoelectron spectroscopy （XPS）, auger electron spectroscopy, and atomic force microscopy, respectively. The influence of substrate negative bias on crystal structure, composition, surface morphology of the TaN films is systematically studied. At the substrate bias of 0 V and -50 V, the amorphous TaN film is obtained. As the bias increases to -100 V, cubic TaN phase can be found. Stoichiometric TaN with hexagonal lattice preferred （300） orientation is prepared at a bias of -200 V. Combine the XRD and XPS results, the binding energy value of 23.6eV of Ta 4f（7/2） is contributed to hexagonal TaN. Compared to other techniques, TaN thin films fabricated by cathodic vacuum arc at various substrate biases show different microstructures.展开更多
脉冲高能量密度等离子体(pu lsed h igh energy density p lasm a,PHEDP)是一项新的材料表面改性技术.它集高电子温度、高能量密度、高定向速度于一身,在制备薄膜时具有沉积薄膜的温度低、沉积效率高、能量利用率高的优点,并兼具表面溅...脉冲高能量密度等离子体(pu lsed h igh energy density p lasm a,PHEDP)是一项新的材料表面改性技术.它集高电子温度、高能量密度、高定向速度于一身,在制备薄膜时具有沉积薄膜的温度低、沉积效率高、能量利用率高的优点,并兼具表面溅射、离子注入、冲击波和强淬火效应等综合效应;它可以制备纳米晶或非晶硬质薄膜,提高基底材料的表面硬度和耐磨、耐蚀性能;能够实现非金属材料表面金属化,所制备薄膜与基底之间存在很宽的混合过渡区,因此膜/基结合良好.文章主要介绍了作者近年来在该领域的部分研究成果,简要介绍了脉冲高能量密度等离子体的原理、特点及应用.分析了脉冲等离子体与材料相互作用的基本物理现象.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 10675165.
文摘Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M NaOH＋0.066M Na2SiO3＋0.008M （NAPO3）6]. The voltage-time responses show that the PEO process of E2 has the highest discharging voltage, which results in the biggest pores and heaviest cracks on the surfaces. X-ray diffraction results show that coatings produced in E1 and E3 are mainly composed of γ-Al2O3 and mullite, while coatings produced in E2 are mainly composed of a-Al2O3. After PEO treatment the corrosion resistance of aluminium is improved significantly and the coatings produced in E3 perform the best corrosion resistance.
基金Supported by the National High Technology Research and Development Programme of China under Grant No 2002AA331020, and the National Natural Science Foundation of China under Grant No 10275088.
文摘A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated by an electric coil around the tube sample, glow arc plasma moves spirally into the tube from its two ends. A negative voltage applied on the tube realized its inner surface implantation. Titanium nitride （TIN） films are prepared on the inner surface of a stainless steel tube in diameter 90mm and length 600mm. Hardness tests show that the hardness at the tube centre is up to 20 GPa. XRD, XPS and AES analyses demonstrate that good quality of TiN films can be achieved.
文摘Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morphology of the films are characterized by x-ray diffraction （XRD）, x-ray photoelectron spectroscopy （XPS）, auger electron spectroscopy, and atomic force microscopy, respectively. The influence of substrate negative bias on crystal structure, composition, surface morphology of the TaN films is systematically studied. At the substrate bias of 0 V and -50 V, the amorphous TaN film is obtained. As the bias increases to -100 V, cubic TaN phase can be found. Stoichiometric TaN with hexagonal lattice preferred （300） orientation is prepared at a bias of -200 V. Combine the XRD and XPS results, the binding energy value of 23.6eV of Ta 4f（7/2） is contributed to hexagonal TaN. Compared to other techniques, TaN thin films fabricated by cathodic vacuum arc at various substrate biases show different microstructures.
文摘脉冲高能量密度等离子体(pu lsed h igh energy density p lasm a,PHEDP)是一项新的材料表面改性技术.它集高电子温度、高能量密度、高定向速度于一身,在制备薄膜时具有沉积薄膜的温度低、沉积效率高、能量利用率高的优点,并兼具表面溅射、离子注入、冲击波和强淬火效应等综合效应;它可以制备纳米晶或非晶硬质薄膜,提高基底材料的表面硬度和耐磨、耐蚀性能;能够实现非金属材料表面金属化,所制备薄膜与基底之间存在很宽的混合过渡区,因此膜/基结合良好.文章主要介绍了作者近年来在该领域的部分研究成果,简要介绍了脉冲高能量密度等离子体的原理、特点及应用.分析了脉冲等离子体与材料相互作用的基本物理现象.
