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基于背向曝光的GaN基脊型LD制备工艺改进
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作者 鲁辞莽 王磊 +3 位作者 孟令海 王建玲 康香宁 胡晓东 《半导体光电》 CAS CSCD 北大核心 2012年第4期503-506,共4页
GaN基脊型激光二极管(LD)的制备工艺中,面临的一个主要困难是p电极和窄脊结构的制备受到光刻对准精度的严重制约。设计和验证了一种基于背向曝光技术的激光器制备工艺。通过预先沉积一层200nm的铝作为挡光掩模和牺牲层,利用ICP蚀刻制备... GaN基脊型激光二极管(LD)的制备工艺中,面临的一个主要困难是p电极和窄脊结构的制备受到光刻对准精度的严重制约。设计和验证了一种基于背向曝光技术的激光器制备工艺。通过预先沉积一层200nm的铝作为挡光掩模和牺牲层,利用ICP蚀刻制备出宽为2.5μm的脊型结构,并使用PECVD沉积SiO2绝缘层。随后采用背向曝光实现二次光刻,将脊型图形精确地转移到电极窗口,继而采用湿法腐蚀SiO2绝缘层打开窗口,借助对的铝掩模腐蚀实现对残余绝缘层的辅助剥离,从而同时解决了目前脊型激光器电极窗口对准困难和绝缘层侧向腐蚀条件难于把握的问题。 展开更多
关键词 激光器 脊型 背向曝光 掩埋金属层
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Improvement of doping efficiency in Mg-Al_(0.14)Ga_(0.86)N/GaN superlattices with AlN interlayer by suppressing donor-like defects 被引量:1
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作者 刘宁炀 刘磊 +8 位作者 王磊 杨薇 李丁 李磊 曹文彧 鲁辞莽 万成昊 陈伟华 胡晓东 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第11期402-407,共6页
We investigate the mechanism for the improvement of p-type doping efficiency in Mg-Al0.14Ga0.86N/GaN super- lattices (SLs). It is shown that the hole concentration of SLs increases by nearly an order of magnitude, f... We investigate the mechanism for the improvement of p-type doping efficiency in Mg-Al0.14Ga0.86N/GaN super- lattices (SLs). It is shown that the hole concentration of SLs increases by nearly an order of magnitude, from 1.1 × 1017 to 9.3×1017 cm-3, when an AlN interlayer is inserted to modulate the strains. SchrSdinger-Poisson self-consistent calculations suggest that such an increase could be attributed to the reduction of donor-like defects caused by the strain modulation induced by the AlN interlayer. Additionally, the donor-acceptor pair emission exhibits a remarkable decrease in intensity of the cathodoluminescence spectrumlfor SLs with an A1N interlayer. This supports the theoretical calculations and indicates that the strain modulation of SLs could be beneficial to the donor-like defect suppression as well as the p-type doping efficiency improvement. 展开更多
关键词 SUPERLATTICE doping efficiency strain modulation nitrogen vacancy
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