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The size effect on transport properties of colossal magnetoresistance materials La_(0.67)Ca_(0.33)MnO_3
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作者 LI PeiGang1,2,LEI Ming1,2,GUO YanFeng2,GUO Xi2,CHEN LeiMing2, TANG WeiHua1,2,SONG PengYun3 & CHEN JinPing3 1 department of physics,Center for Optoelectronics Materials and Devices,Zhejiang Sci-Tech university,Hangzhou 310018,china 2 National Laboratory for Condensed Matter physics,Institute of physics,Chinese Academy of Sciences,beijing 100080,china 3 department of physics,peking university,beijing 100875,china 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2008年第3期251-257,共7页
High quality La0.67Ca0.33MnO3 (LCMO) film was deposited via a novel pulsed electron deposition technique on SrTiO3(100) single crystal substrate. The micro-bridge with different widths was fabricated by using electron... High quality La0.67Ca0.33MnO3 (LCMO) film was deposited via a novel pulsed electron deposition technique on SrTiO3(100) single crystal substrate. The micro-bridge with different widths was fabricated by using electron beam lithography (EBL) technique and their transport properties were studied. For the micro-bridges with width of 2 and 1.5 μm,the insulator-to-metal transition temperature (TP) keeps un-changed compared with the film. For the micro-bridges with width of 1 μm,the TP shifts towards the lower temperature by 50 K. When the width decreases down to 500 nm,the insulator-to-metal transition disappears. The magnetoresistance be-havior of these micro-bridges was studied,and the results show that the low field magnetoresistance (LFMR) decreases and the high field magnetoresistances (HFMR) keep almost unchanged as the width of micro-bridge is reduced. 展开更多
关键词 colossal MAGNETORESISTANCE PULSED ELECTRON deposition ELECTRON beam LITHOGRAPHY electrical TRANSPORT properties
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