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Structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond films 被引量:1
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作者 Hui Xu Jian-Jun Liu +3 位作者 Hai-Tao Ye D J Coathup a v khomich Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第9期426-433,共8页
We investigate the structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond(UNCD)films. Impedance spectroscopy measurements show that the impedance of diamond grains is relatively st... We investigate the structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond(UNCD)films. Impedance spectroscopy measurements show that the impedance of diamond grains is relatively stable, while that of grain boundaries(GBs)(Rb) significantly increases after the C~+ implantation, and decreases with the increase in the annealing temperature(Ta) from 650℃ to 1000℃. This implies that the C~+ implantation has a more significant impact on the conductivity of GBs. Conductive atomic force microscopy demonstrates that the number of conductive sites increases in GB regions at Ta above 900℃, owing to the formation of a nanographitic phase confirmed by high-resolution transmission electronic microscopy. Visible-light Raman spectra show that resistive trans-polyacetylene oligomers desorb from GBs at Ta above 900℃, which leads to lower Rb of samples annealed at 900 and 1000℃. With the increase in Ta to 1000℃, diamond grains become smaller with longer GBs modified by a more ordered nanographitic phase, supplying more conductive sites and leading to a lower Rb. 展开更多
关键词 ultrananocrystalline diamond C-ion implantation ANNEALING electrical properties
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