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X-Ray Diffraction Study of Plasma Exposed and Annealed AlSb Bilayer Thin Film 被引量:1
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作者 T. abdul KaREEM a. anu kaliani 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第4期382-385,共4页
Aluminum antimony seems to be a promising semiconducting material for high temperature applications, especially for transistors and P-N junction diodes. Additionally, it is a highly efficient solar material. This pape... Aluminum antimony seems to be a promising semiconducting material for high temperature applications, especially for transistors and P-N junction diodes. Additionally, it is a highly efficient solar material. This paper discusses the plasma induced bilayer diffusion of A1Sb bilayer thin films using X-ray diffractogram. A1Sb bilayer thin films were prepared on a glass substrate by vacuum evaporation technique. The effect of plasma exposure time and annealing temperature on the micro-structural parameters were investigated. X-ray diffraction studies show that the cubic crystals of A1 orient along the (111) plane and the hexagonal crystals of Sb orient along the (003) plane. Newly formed cubic crystals of A1Sb are oriented along the (200) plane and they are formed due to the simultaneous growth of A1 and Sb crystals during plasma exposure. 展开更多
关键词 Aluminum antimony BILAYER plasma exposure bilayer mixing
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