农业土地上的污水污泥的使用为它的处理提供一种选择。因此，现在的学习的目的是评估使用在巴基斯坦生产的工业污水污泥的可行性，作为农业化肥。与 250 g kg 修改的农业土壤 ? 1 污水污泥与或没有石灰处理被用于普通本地谷类罪的生长...农业土地上的污水污泥的使用为它的处理提供一种选择。因此，现在的学习的目的是评估使用在巴基斯坦生产的工业污水污泥的可行性，作为农业化肥。与 250 g kg 修改的农业土壤 ? 1 污水污泥与或没有石灰处理被用于普通本地谷类罪的生长，玉米(Zea 玉米) 。在污泥样品的踪迹和有毒的金属的活动性被使用一个修改 BCR 顺序的抽取过程估计。单个抽取过程由温和提炼之物(CaCl2 ) 和水的申请组成，为容易可溶的金属部分的比例的评价。为了在顺序的抽取过程的每步检查分析结果，踪迹的集中和有毒的金属的精确，被总结并且与全部的金属集中相比。植物可得到的金属满足，由 deionized 水和 0.01 摩尔 L 显示了? 1 CaCl2 答案抽取部分和顺序的抽取的可交换的部分，显著地减少了( P < 0.05 )用石灰申请因为在更高的 pH 的减少的金属可获得性，除了在 Cd 和 Cu 的情况中，其活动性是，稍微增加了。污泥改正提高了玉米的干燥重量收益，增加为有石灰处理的土壤是更明显的。施用石灰污水污泥在谷物纸巾减少了踪迹和有毒的金属内容除了 Cu 和 Cd，它在这些金属的可允许的限制下面。现在的实验证明施用石灰是在在修改污泥的土壤便于玉米的生长的一个重要因素。展开更多
Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was inves...Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline strucure of the films transforms from the （101） to （002） oriented hexagonal CrzN phase as the increase of substrate tempera- ture above 50℃, and a highly texatred film grows at 100℃. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared （FTIR） spectrum of the film prepared at 50℃ exhibits only A1 （TO） mode. The prominent peak in the FTIR spectra of the film prepared above 50℃is assigned to the E1 （TO） mode and is correlated with the （002） or c-axis oriented hexagonal wurtzite phase of Cr2N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100℃, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200℃ causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index （n） of the deposited films is obtained using spectroscopic ellipsometry.展开更多
基金financially supported by the National Institute of Laser and Optronics(NILOP)
文摘Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline strucure of the films transforms from the （101） to （002） oriented hexagonal CrzN phase as the increase of substrate tempera- ture above 50℃, and a highly texatred film grows at 100℃. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared （FTIR） spectrum of the film prepared at 50℃ exhibits only A1 （TO） mode. The prominent peak in the FTIR spectra of the film prepared above 50℃is assigned to the E1 （TO） mode and is correlated with the （002） or c-axis oriented hexagonal wurtzite phase of Cr2N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100℃, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200℃ causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index （n） of the deposited films is obtained using spectroscopic ellipsometry.
