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Substrate Temperature Dependent Properties of Cu Doped NiO Films Deposited by DC Reactive Magnetron Sputtering 被引量:2
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作者 Yarraguntla Ashok Kumar reddy akepati sivasankar reddy Pamanji Sreedhara reddy 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2013年第7期647-651,共5页
The NiO-Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique. The effect of substrate temperature on the structural, optical, morpholog... The NiO-Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique. The effect of substrate temperature on the structural, optical, morphological and electrical properties of the films was mainly investigated. X-ray diffraction studies revealed that when the substrate temperature increased to above 200 ℃, the preferred orientation tended to move to another preferred site from (220) to (111) and had a band gap values increased with increasing substrate observed that the grain size and root mean square stable cubic structure. The optical transmittance and temperature. From the morphological studies, it was roughness were increased with increasing substrate temperature. The electrical resistivity of the film decreased to 0.017 Ωcm at high substrate temperature of 400 ℃. 展开更多
关键词 SPUTTERING NiO-Cu composite films Substrate temperature Crystallite size Electrical resistivity
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