期刊文献+
共找到3篇文章
< 1 >
每页显示 20 50 100
Comparison of RFFIT Tests with Different Standard Sera and Testing Procedures 被引量:6
1
作者 Peng-cheng Yu akira noguchi +3 位作者 Satoshi Inoue Qing Tang Simon Rayner Guo-dong Liang 《Virologica Sinica》 CAS CSCD 2012年第3期187-193,共7页
The World Health Organization (WHO) standard assay for determining antibody level is the rapid fluorescent focus inhibition test (RFFIT) and is used to determine the degree of immunity after vaccination against rabies... The World Health Organization (WHO) standard assay for determining antibody level is the rapid fluorescent focus inhibition test (RFFIT) and is used to determine the degree of immunity after vaccination against rabies. To compare the difference in RFFIT results between the laboratories of The National Institute of Infectious Disease in Japan (NIID) and the Chinese Centre for Disease Control (CCDC) as well the influence of the choice of standard serum (STD) for the detection, the two laboratories detection methods were simultaneously manipulated by RFFIT. The reference serums used in NIID and the WHO standard serum used in CCDC were compared in the same RFFIT detection to determine the titer of four sera samples C1, S1, S2 and S4 in parallel, and the titers of the detected sera samples were calculated using the standard formula for neutralizing antibody titer. No significant difference was found in RFFIT methods from the two laboratories and the RFFIT testing procedures of the two laboratories have good consistency. However, different titers were obtained with the tentative internal standard serum (TI-STD) produced by adjusting to 2.0 IU of WHO standard serum in NIID and the WHO STD. The titer determined with the TI-STD was higher than that determined with WHO STD, This difference appears to be significant and requires further investigation. 展开更多
关键词 血清样品 标准试验 测试程序 试验比较 中国疾病预防控制中心 世界卫生组织 抗体滴度 实验室
下载PDF
Scattering Characteristics of Liquid Droplets Spun Off from Rotating Disk Edge
2
作者 Mizue MUNEKATA akira noguchi +2 位作者 Jun NISHIYAMA Hiroaki KURISHIMA Hiroyuki YOSHIKAWA 《Journal of Thermal Science》 SCIE EI CAS CSCD 2012年第1期42-48,共7页
Scattering characteristics of liquid droplets spun off from a rotating disk edge are experimentally investigated. In the present research, aluminum disks are utilized and ethanol is employed for liquid. Scattering phe... Scattering characteristics of liquid droplets spun off from a rotating disk edge are experimentally investigated. In the present research, aluminum disks are utilized and ethanol is employed for liquid. Scattering phenomena of the droplets are captured by the high-speed digital camera. Frequency distribution of the droplet diameter is evaluated from these images and distributions of horizontal flying velocity and angle of the droplets were measured by PTV. Liquid filaments are stretched outward from the stagnant liquid layer by centrifugal force and skew complicatedly by aerodynamic force. Some peaks appear in the distribution of the scattered droplet diameter and they are origi- nated from large terminal droplets and small droplets generated from filamentwise breakup. Most of the scattered droplets fly slightly inside in the tangential direction of the disk edge. The droplets spun off from the thin disk scatter widely compared with that from the thick one. 展开更多
关键词 液滴直径分布 散射特性 旋转盘 剥离 液体层 数码相机 分布计算 飞行速度
原文传递
Drying of Flowing Liquid Film on Rotating Disk
3
作者 Mizue MUNEKATA Jun NISHIYAMA +3 位作者 akira noguchi Hiroaki KURISHIMA Hiroyuki YOSHIKAWA Hideki OHBA 《Journal of Thermal Science》 SCIE EI CAS CSCD 2010年第3期234-238,共5页
Recently,development of high technology has been required for the formation of uniform thin film in manufacturing processes of semiconductor as the precision instruments become more sophisticated.A method called spin ... Recently,development of high technology has been required for the formation of uniform thin film in manufacturing processes of semiconductor as the precision instruments become more sophisticated.A method called spin coating is often used for spreading photoresist on a wafer surface and drying photoresist film.In spin coating process,photoresist is uniformly spread on the wafer surface by centrifugal force caused by rotating wafer.However,it is a serious concern that streaky lines,which are caused by spiral vortices,appear on the wafer surface and prevent the formation of uniform film in the case of high rotating speed.On the other hand,in the case of low rotating speed,a small hump of the film is formed near the wafer edge.The main purpose of this study is to make clear the drying characteristics of the flowing liquid film on the rotating wafer.Temperature distribution of the flowing liquid film is captured by an infrared thermal video camera and radial gradient of the film temperature is introduced in order to evaluate the drying characteristic of the flowing film under steady state condition.Effects of the flow rate of the liquid film on the film temperature are investigated.The film temperature gradually decreases in the radial direction in all cases.At low rotating speed,the radial gradient of the film temperature is almost constant widely.On the other hand,at high rotating speed,the radial gradient of the film temperature takes a certain maximum value.It is found that the location of the gradient peak corresponds with the transition region of the air boundary layer,in which spiral vortices swirl,and shifts to the inner side of the disk with an increase of the liquid flow rate. 展开更多
关键词 流动液膜 旋转圆盘 干燥
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部