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Enhancement of output power density in a modified polytetrafluoroethylene surface using a sequential O_(2)/Ar plasma etching for triboelectric nanogenerator applications
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作者 Teerayut Prada Viyada Harnchana +6 位作者 anthika lakhonchai Artit Chingsungnoen Phitsanu Poolcharuansin Narong Chanlek Annop Klamchuen Prasit Thongbai Vittaya Amornkitbamrung 《Nano Research》 SCIE EI CSCD 2022年第1期272-279,共8页
In this work,the surface modification using a two-steps plasma etching has been developed for enhancing energy conversion performance in polytetrafluoroethylene(PTFE)triboelectric nanogenerator(TENG).Enhancing surface... In this work,the surface modification using a two-steps plasma etching has been developed for enhancing energy conversion performance in polytetrafluoroethylene(PTFE)triboelectric nanogenerator(TENG).Enhancing surface area by a powerful O_(2) and Ar bipolar pulse plasma etching without the use of CF_(4) gas has been demonstrated for the first time.TENG with modified surface PTFE using a sequential two-step O_(2)/Ar plasma has a superior power density of 9.9 W·m^(-2),which is almost thirty times higher than that of a pristine PTFE TENG.The synergistic combination of high surface area and charge trapping sites due to chemical bond defects achieved from the use of a sequential O_(2)/Ar plasma gives rise to the intensified triboelectric charge density and the enhancement of power output of PTFE-based TENG.The effects of plasma species and plasma etching sequence on surface morphologies and surface chemical species were investigated by a field emission scanning electron microscopy(FESEM),atomic force microscopy(AFM),and X-ray photoelectron spectroscopy(XPS).The correlation of surface morphology,chemical structure,and TENG performance was elucidated.In addition,the applications of mechanical energy harvesting for lighting,charging capacitors,keyboard sensing and operating a portable calculator were demonstrated. 展开更多
关键词 two-step plasma etching O_(2)and Ar plasma CF_(4)free triboelectric nanogenerator power output enhancement
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