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Quasi-Chemical Reactions in Irradiated Silicon Crystals with Regard to Ultrafast Irradiation
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作者 Hrant N. Yeritsyan Aram A. sahakyan +5 位作者 Norair E. Grigoryan Vachagan V. Harutyunyan Bagrat A. Grigoryan Gayane A. Amatuni arsham s. yeremyan Christopher J. Rhodes 《Journal of Modern Physics》 2018年第6期1271-1280,共10页
This paper reports results from an investigation of the interaction of displaced Si-self atoms (I) and their vacancies (V), with impurities in crystalline silicon (Si), as induced by micro-second pulse duration irradi... This paper reports results from an investigation of the interaction of displaced Si-self atoms (I) and their vacancies (V), with impurities in crystalline silicon (Si), as induced by micro-second pulse duration irradiation with electrons at different energies: 3.5, 14, 25 and 50 MeV and pico-second pulse duration with energy 3.5 MeV. V-V, I-impurity atom and V-impurity atom interactions are analyzed both experimentally and as modeled using computer simulations. A process of divacancy (V2) accumulation in the dose-dependent linear region is investigated. The effect of impurities on recombination of correlated divacancies, and I-atoms that had become displaced from regular lattice points is estimated by computer modeling of an appropriate diffusion-controlled process. It is concluded that the experimental results can be interpreted quantitatively in terms of a strongly anisotropic quasi-one-dimensional diffusion of displaced I-atoms. In addition, a significant difference is found between the effects of pico-second duration electron beam irradiation, which causes the formation of A-centre (V + Oxygen) clusters, while when the beam is applied on a micro-second timescale, divacancies are created instead, although the electrons have the same energy in both cases. 展开更多
关键词 Silicon Crystal Electron IRRADIATION DIVACANCY Radiation Defects Introduction Rate IMPURITY ATOM
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