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Pulsed DC magnetron sputtering of transparent conductive oxide layers
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作者 astrid bingel Kevin Fiichsel +1 位作者 Norbert Kaiser Andreas Tunnerman 《Chinese Optics Letters》 SCIE EI CAS CSCD 2013年第13期21-25,共5页
A comprehensive material study of different transparent conductive oxides (TCOs) is presented. The layers are deposited by pulsed direct current (DC) magnetron sputtering in an inline sputtering system. Indium tin... A comprehensive material study of different transparent conductive oxides (TCOs) is presented. The layers are deposited by pulsed direct current (DC) magnetron sputtering in an inline sputtering system. Indium tin oxide (ITO) films are studied in detail. The optimum pressure of 0.33 Pa (15Ar:202) produces a 300- nm thin film with a specific resistivity p of 2.2 × 10-6 Ωm and a visual transmittance of 81%. Alternatively, ZnO:A1 and ZnO:Ga layers with thicknesses of 200 and 250 nm are deposited with a minimum resistivity of 5.5× 10-6 and 6.8× 10-6Ωm, respectively. To compare the optical properties in the ultraviolet (UV) range, the optical spectra are modeled and the band gap is determined. 展开更多
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