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Boron-Silicon Thin Film Formation Using a Slim Vertical Chemical Vapor Deposition Reactor
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作者 Yuki Kamochi atsuhiro motomiya +3 位作者 Hitoshi Habuka Yuuki Ishida Shin-Ichi Ikeda Shiro Hara 《Advances in Chemical Engineering and Science》 CAS 2023年第1期7-18,共12页
A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900&#8451;in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reacto... A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900&#8451;in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reactor designed for the Minimal Fab system. The gas flow rates were 80, 20 and 0.1 - 20 sccm for the hydrogen, dichlorosilane and boron trichloride gases, respectively. The gas transport condition in the reactor was shown to quickly become stable when evaluated by quartz crystal microbalances at the inlet and outlet. The boron-silicon thin film was formed by achieving the various boron concentrations of 0.16% - 80%, the depth profile of which was flat. By observing the cross-sectional TEM image, the obtained film was dense. The boron trichloride gas is expected to be useful for the quick fabrication of various materials containing boron at significantly low and high concentrations. 展开更多
关键词 Chemical Vapor Deposition Boron-Silicon Film Boron Trichloride DICHLOROSILANE
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