Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated...Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated desorption.These characteristics make it an ideal solution for resolving the non-uniform pressure distribution in conductance-limited narrow vacuum tubes.In this study,ternary Ti-Zr-V films were deposited on Si substrates and Ag-Cu(Ag 0.085 wt%)tubes with an inner diameter of 22 mm.All Ti-Zr-V films were prepared from an alloy target using the same DC magnetron sputtering parameters.The compositions and corresponding chemical bonding states were analyzed by X-ray photoelectron spectroscopy after activation at different temperatures.The test particle Monte Carlo(TPMC)method was used to measure the sticking probability of the Ti-Zr-V film based on pressure readings during gas injection.The results indicate that activation commences at temperatures as low as 150℃and Ti~0,Zr~0,and V~0 exist on the surface after annealing at 180℃for 1 h.Ti-Zr-V films can be fully activated at 180℃for 24 h.The CO sticking probability reaches 0.15,with a pumping capacity of 1 monolayer.展开更多
基金supported by the National Natural Science Foundation of China(Nos.11975226,11905219)the Fundamental Research Funds for the Central Universities(No.WK2310000071)the National Key Research and Development Program of China(2016YFA0402004).
文摘Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated desorption.These characteristics make it an ideal solution for resolving the non-uniform pressure distribution in conductance-limited narrow vacuum tubes.In this study,ternary Ti-Zr-V films were deposited on Si substrates and Ag-Cu(Ag 0.085 wt%)tubes with an inner diameter of 22 mm.All Ti-Zr-V films were prepared from an alloy target using the same DC magnetron sputtering parameters.The compositions and corresponding chemical bonding states were analyzed by X-ray photoelectron spectroscopy after activation at different temperatures.The test particle Monte Carlo(TPMC)method was used to measure the sticking probability of the Ti-Zr-V film based on pressure readings during gas injection.The results indicate that activation commences at temperatures as low as 150℃and Ti~0,Zr~0,and V~0 exist on the surface after annealing at 180℃for 1 h.Ti-Zr-V films can be fully activated at 180℃for 24 h.The CO sticking probability reaches 0.15,with a pumping capacity of 1 monolayer.
