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Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate 被引量:1
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作者 Chun-Yan Yan bao-an liu +2 位作者 Xiang-Cao Li Chang liu Xin Ju 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第2期432-437,共6页
Time-dependent damage to fused silica induced by high frequency ultraviolet laser is investigated.Photothermal spectroscopy(PTS) and optical microscopy(OM) are utilized to characterize the evolution of damage pits wit... Time-dependent damage to fused silica induced by high frequency ultraviolet laser is investigated.Photothermal spectroscopy(PTS) and optical microscopy(OM) are utilized to characterize the evolution of damage pits with irradiation time.Experimental results describe that in the pre-damage stage of fused silica sample irradiated by 355-nm laser,the photothermal spectrum signal undergoes a process from scratch to metamorphism due to the absorption of laser energy by defects.During the visible damage stage of fused siliea sample,the photothermal spectrum signal decreases gradually from the maximum value because of the aggravation of the damage and the splashing of the material.This method can be used to estimate the operation lifetime of optical elements in engineering. 展开更多
关键词 PHOTOTHERMAL spectroscopy FUSED SILICA LASER-INDUCED DAMAGE
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