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Influence of N2 flow rate on structure and properties of TiBCN films prepared by multi-cathodic arc ion plating and studied with ion beam scattering spectroscopy
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作者 Bin Han Ze-Song Wang +4 位作者 D. Neena bao-zhu lin Bing Yang Chuan-Sheng Liu De-Jun Fu 《Nuclear Science and Techniques》 SCIE CAS CSCD 2017年第5期9-17,共9页
TiBCN films were deposited on Si(100) and cemented carbide substrates by using multi-cathodic arc ion plating in C_2H_2 and N_2atmosp^here. Their structure and mechanical properties were studied systematically under d... TiBCN films were deposited on Si(100) and cemented carbide substrates by using multi-cathodic arc ion plating in C_2H_2 and N_2atmosp^here. Their structure and mechanical properties were studied systematically under different N_2 flow rates. The results showed that the Ti BCN films were adhered well to the substrates. Rutherford backscattering sp^ectroscopy was employed to determine the relative concentration of Ti, B, C and N in the films.The chemical bonding states of the films were explored by X-ray photoelectron sp^ectroscopy, revealing the presence of bonds of Ti N, Ti(C,N), BN, pure B, sp^2C–C and sp^3C–C, which changed with the N_2 flow rate. Ti BCN films contain nanocrystals of Ti N/Ti CN and Ti B_2/Ti(B,C)embedded in an amorphous matrix consisting of amorphous BN and carbon at N_2 flow rate of up to 250 sccm. 展开更多
关键词 TiBCN Nanocomposite N2 flow rate RUTHERFORD BACKSCATTERING SPECTROSCOPY (RBS) X-ray PHOTOELECTRON SPECTROSCOPY
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