Surface treatments of CdGeAs2 single crystals

The performances of second harmonic gen eration (SHG) and optical parametric oscillator (OPO) in CdGeAs2 crystal are strongly influenced by surface quality. In this paper, the surfaces of samples were treated by mechanical polishing (MP), chemical polishing (CP), chemical-mechanical polishing (CMP) and CP following CMP closely (CMP + CP). Then, the surface state was characterized by optical microscopy (OM), scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). AFM measurements show that an ultra-smooth surface is achieved after CMP + CP treatment and the roughness value is 0.98 nm. Meanwhile, the roughness of the surfaces treated by MP, CP and CMP are 4.53, 2.83 and 1.38 nm, respectively. By XRD rocking curves, the diffraction peak which belongs to the wafer treated by CMP + CP is the highest in intensity and best symmetrical in shape. XPS analysis indicates that Ge4+ proportions of GeO2 in total Ge content of CdGeAs2 wafers' surface after MP, CP, CMP and CMP + CP treatment are 27.6%, 42.8%, 6.1% and 30.3%, respectively.

Growth and characterizations of CdGeAs2single crystal by descending crucible with rotation method

By the method of descending crucible with rotation, crack-free CdGeAs2single crystals of U15 mm 950 mm were grown in a furnace with three independen heating zones after optimizing the temperature field, and the descending and rotational speed to meet the need of CdGeAs2crystal growth. The properties of as-grown crysta were characterized by a variety of techniques. The results of X-ray diffraction（XRD） show that there are two cleavage faces, which are（110） and（101）. The peaks are in high intensity and good symmetry, which demonstrates that the crystal is integral in structure and well crystallized. The energy-dispersive spectrometry results indicate that the wafer of the CdGeAs2crystal is closer to the stoichiometry The IR transmittance of the wafer is ＊48.6 % at 5.5 lm, and the maximum value is up to 51.6 % in the range of2.3–18.0 lm. Etch pits of（001） face are observed and the density of the etch pits is evaluated to be 1 9 105cm-2.

Annealing and optical homogeneity of large ZnGeP_(2) single crystal

A high-quality ZnGeP_(2)(ZGP)single crystal with large size ofΦ30 mm×80 mm was grown by a modified vertical Bridgman method.ZGP wafers were annealed with ZGP polycrystalline powder for 300 h at 550,600 and 650℃,respectively.The as-grown and annealed crystals were characterized by X-ray diffraction(XRD)analysis,Fourier transform infrared spectroscopy(FTIR),IR microscope and energy-dispersive spectroscopy(EDS).Results show that the quality of all wafers is improved evidently after annealing and the optimum annealing temperature obtained is 600℃.The IR transmittance of the wafer measured by FTIR is up to 56.78%at wavelength of 2.0μm nearby and exceeds 59.00%in the wavelength range of 3.0-8.0μm.The deviations from stoichiometry decrease,and the homogeneity of the crystal is also improved after annealing.In this paper,scanning infrared map was proposed as a new nondestructive method to evaluate optical quality and homogeneity of crystal through comparing the IR transmittance with the three-dimensional IR spectral contour map.