Metal vapor vacuum arc (MEVVA) source ion implantation is a new technology used for achieving long range ion impantation.It is very important for research and application of the ion beammodification of materials. The ...Metal vapor vacuum arc (MEVVA) source ion implantation is a new technology used for achieving long range ion impantation.It is very important for research and application of the ion beammodification of materials. The results showthat the implanted atom diffusion coefficient increases in Mo implanted Al with high ion flux andhigh dose. The implanted depth is 311.6 times greater than that ofthe corresponding ion range. The ionspecies, doses and ion fluxes play an important part in the long-range implantation. Especially,thermal atom chemistry have specific effect on the long-range implantation during high ion fluximplantation at transient high target temperature.展开更多
基金The National Natural Science Foundation (Nos.59671051 and 59871003), and tile 863High Technology Program (863-715-023-02-01)
文摘Metal vapor vacuum arc (MEVVA) source ion implantation is a new technology used for achieving long range ion impantation.It is very important for research and application of the ion beammodification of materials. The results showthat the implanted atom diffusion coefficient increases in Mo implanted Al with high ion flux andhigh dose. The implanted depth is 311.6 times greater than that ofthe corresponding ion range. The ionspecies, doses and ion fluxes play an important part in the long-range implantation. Especially,thermal atom chemistry have specific effect on the long-range implantation during high ion fluximplantation at transient high target temperature.
