The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation.Mo/Si multilayers were annealed at temperature...The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation.Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K,treated with acetone and 5‰NaOH solution,and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy and Olympus microscopy.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No.69578023。
文摘The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation.Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K,treated with acetone and 5‰NaOH solution,and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy and Olympus microscopy.