The single photonic quantum well （PQW） structures are successfully fabricated on ptype silicon wafer by electro chemical etching process, and are used for DNA detection firstly. The red shift of resonance peak is ca...The single photonic quantum well （PQW） structures are successfully fabricated on ptype silicon wafer by electro chemical etching process, and are used for DNA detection firstly. The red shift of resonance peak is caused by the changing refractive index of PSi layer, which results from coupling of organic molecules into pores. When the porous silicon （PSi） based single PQW biosensors are immersed in complementary deoxyribonucleic acid （DNA） with differ ent concentrations ranging from 0.625 pM to 10,000 pM, a good linear relationship is observed between the red shift of resonance peak and the complementary DNA concentration. Experimental results show that the detection sensitivity of PSibased single PQW biosensors is 3.04 nm/M with a detection limit of 32 nM for 16base pair DNA oligonu cleotides.展开更多
基金This work has been supported by the National Natural Science Foundation of China （Nos.61265009 and 11264038）, the Research Foundation for the Doctoral Program of Chinese universities （No.20116501110003）, and the Xinjiang Science and Technology Project （No. 201291109）.
文摘The single photonic quantum well （PQW） structures are successfully fabricated on ptype silicon wafer by electro chemical etching process, and are used for DNA detection firstly. The red shift of resonance peak is caused by the changing refractive index of PSi layer, which results from coupling of organic molecules into pores. When the porous silicon （PSi） based single PQW biosensors are immersed in complementary deoxyribonucleic acid （DNA） with differ ent concentrations ranging from 0.625 pM to 10,000 pM, a good linear relationship is observed between the red shift of resonance peak and the complementary DNA concentration. Experimental results show that the detection sensitivity of PSibased single PQW biosensors is 3.04 nm/M with a detection limit of 32 nM for 16base pair DNA oligonu cleotides.
