The sheet resistance Rs and temperature coefficient of resistance(TCR)α(25-100°C)of amorphous Ni68Si15B17 films have been measured.The structure of films with Rs between 80-550Ω/sq.are more stable and have a lo...The sheet resistance Rs and temperature coefficient of resistance(TCR)α(25-100°C)of amorphous Ni68Si15B17 films have been measured.The structure of films with Rs between 80-550Ω/sq.are more stable and have a lower TCR(10-6K-1-10-5K-1).In this range of Rs,TCR may change its sign,and the activation energy is much larger.展开更多
基金This work was supported by the Science Fuiid of the Chinese Academy of Science.
文摘The sheet resistance Rs and temperature coefficient of resistance(TCR)α(25-100°C)of amorphous Ni68Si15B17 films have been measured.The structure of films with Rs between 80-550Ω/sq.are more stable and have a lower TCR(10-6K-1-10-5K-1).In this range of Rs,TCR may change its sign,and the activation energy is much larger.
