TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties...TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from（111） to（220） and finally to the coexistence of（111） and（220） texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the（111） planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E＊2 ratio in the manner that a higher H3/E＊2 ratio was conducive to the enhancement of the wear resistance.展开更多
CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microst...CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microstructure, surface morphology, surface roughness, hardness and film/substrate adhesion of the film were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope（SEM）, surface morphology analyzer, Vickers microhardness test and scratch test. The results showed that the magnetic field puts much effect on the microstructure,chemical composition, hardness and film/substrate adhesion of the Cr N films. The N content increases and Cr content decreases when the magnetic flux density increases from 0 to 30 m T. All of the Cr N films were found to be substoichiometric. With an increase in the magnetic flux density, the film structures change in such way： Cr_2N →Cr_（2-N）＋CrN→CrN＋Cr_2N→CrN.The SEM results showed that the number of macroparticles（MPs） on the film surface is significantly reduced when the magnetic flux density increases to 10 mT or higher. The surface roughness decreases with the magnetic field, which is attributed to the fewer MPs and sputtered craters on the film surface. The hardness value increases from 2074 HV_（0.025） at 0 mT（without magnetic field） and reaches a maximum value of 2509 HV_（0.025） at 10 m T.The further increase in the magnetic flux density leads to a decrease in the film hardness. The critical load of film/substrate adhesion shows a monotonous increase with the increase in magnetic flux density.展开更多
The reliability of a substrate curvature-based stress measurement method for CrN thin films on substrate with fluctuant surface was discussed.The stress error led by the ignorance of substrate thermal deformation was ...The reliability of a substrate curvature-based stress measurement method for CrN thin films on substrate with fluctuant surface was discussed.The stress error led by the ignorance of substrate thermal deformation was studied.Results showed that this error could be as large as several hundred MPa under general deposition conditions.Stress in the CrN thin films with different thicknesses ranging from 110 to 330 nm on stainless steel was studied by this method,in comparison with conventional results on silicon wafer.The thin films＇ morphology and structure were investigated and related to the film stress.A significant result of the comparison is that stress evolution in the thin films on steel obviously differs from that on silicon wafer,not only because the two substrates have different coefficients of thermal expansion,which provokes thermal stress,but also the considerable discrepancy in the thin films＇ grain coarsening rate and structure that induce different intrinsic stresses.展开更多
基金financially supported by the National Natural Science Foundation of China (No. 51171197)
文摘TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from（111） to（220） and finally to the coexistence of（111） and（220） texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the（111） planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E＊2 ratio in the manner that a higher H3/E＊2 ratio was conducive to the enhancement of the wear resistance.
基金supported by Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Dalian University of Technology)Ministry of Education (Grant No. LABKF1405)
文摘CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microstructure, surface morphology, surface roughness, hardness and film/substrate adhesion of the film were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope（SEM）, surface morphology analyzer, Vickers microhardness test and scratch test. The results showed that the magnetic field puts much effect on the microstructure,chemical composition, hardness and film/substrate adhesion of the Cr N films. The N content increases and Cr content decreases when the magnetic flux density increases from 0 to 30 m T. All of the Cr N films were found to be substoichiometric. With an increase in the magnetic flux density, the film structures change in such way： Cr_2N →Cr_（2-N）＋CrN→CrN＋Cr_2N→CrN.The SEM results showed that the number of macroparticles（MPs） on the film surface is significantly reduced when the magnetic flux density increases to 10 mT or higher. The surface roughness decreases with the magnetic field, which is attributed to the fewer MPs and sputtered craters on the film surface. The hardness value increases from 2074 HV_（0.025） at 0 mT（without magnetic field） and reaches a maximum value of 2509 HV_（0.025） at 10 m T.The further increase in the magnetic flux density leads to a decrease in the film hardness. The critical load of film/substrate adhesion shows a monotonous increase with the increase in magnetic flux density.
文摘The reliability of a substrate curvature-based stress measurement method for CrN thin films on substrate with fluctuant surface was discussed.The stress error led by the ignorance of substrate thermal deformation was studied.Results showed that this error could be as large as several hundred MPa under general deposition conditions.Stress in the CrN thin films with different thicknesses ranging from 110 to 330 nm on stainless steel was studied by this method,in comparison with conventional results on silicon wafer.The thin films＇ morphology and structure were investigated and related to the film stress.A significant result of the comparison is that stress evolution in the thin films on steel obviously differs from that on silicon wafer,not only because the two substrates have different coefficients of thermal expansion,which provokes thermal stress,but also the considerable discrepancy in the thin films＇ grain coarsening rate and structure that induce different intrinsic stresses.
