Narrow-gap Hg_(1-x)Cd_x Te material with a composition x of about 0.3 plays an extremely important role in mid-infrared detection applications. In this work, the optical properties of doped HgCdTe with x ≈ 0.3 are re...Narrow-gap Hg_(1-x)Cd_x Te material with a composition x of about 0.3 plays an extremely important role in mid-infrared detection applications. In this work, the optical properties of doped HgCdTe with x ≈ 0.3 are reviewed, including the defects and defect levels of intrinsic V_(Hg) and the extrinsic amphoteric arsenic(As) dopants, which can act as shallow/deep donors and acceptors. The influence of the defects on the determination of band-edge electronic structure is discussed when absorption or photoluminescence spectra are considered. The inconsistency between these two optical techniques is demonstrated and analyzed by taking into account the Fermi level position as a function of composition, doping level,conductivity type, and temperature. The defect level and its evolution, especially in As-doped HgCdTe, are presented. Our results provide a systematic understanding of the mechanisms and help for optimizing annealing conditions towards p-type As-activation, and eventually for fabricating high performance mid-infrared detectors.展开更多
We design and fabricate a good performance silicon photoconductive terahertz detector on sapphire substrates at room temperature.The best voltage responsivity of the detector is 6679 V/W at frequency 300 GHz as well a...We design and fabricate a good performance silicon photoconductive terahertz detector on sapphire substrates at room temperature.The best voltage responsivity of the detector is 6679 V/W at frequency 300 GHz as well as low voltage noise of 3.8 nV/Hz1/2 for noise equivalent power 0.57 pW/Hz1/2.The measured response time of the device is about 9μs,demonstrating that the detector has a speed of>110 kHz.The achieved good performance,together with large detector size(acceptance area is 3μm×160μm),simple structure,easy manufacturing method,compatibility with mature silicon technology,and suitability for large-scale fabrication of imaging arrays provide a promising approach to the development of sensitive terahertz room-temperature detectors.展开更多
基金Project supported by the Major Program of the National Natural Science Foundation of China(Grant Nos.61790583,61874043,61874045,and 61775060)the National Key Research and Development Program,China(Grant No.2016YFB0501604)
文摘Narrow-gap Hg_(1-x)Cd_x Te material with a composition x of about 0.3 plays an extremely important role in mid-infrared detection applications. In this work, the optical properties of doped HgCdTe with x ≈ 0.3 are reviewed, including the defects and defect levels of intrinsic V_(Hg) and the extrinsic amphoteric arsenic(As) dopants, which can act as shallow/deep donors and acceptors. The influence of the defects on the determination of band-edge electronic structure is discussed when absorption or photoluminescence spectra are considered. The inconsistency between these two optical techniques is demonstrated and analyzed by taking into account the Fermi level position as a function of composition, doping level,conductivity type, and temperature. The defect level and its evolution, especially in As-doped HgCdTe, are presented. Our results provide a systematic understanding of the mechanisms and help for optimizing annealing conditions towards p-type As-activation, and eventually for fabricating high performance mid-infrared detectors.
基金Supported by the National Natural Science Foundation of China under Grant Nos 61775060 and 61275100
文摘We design and fabricate a good performance silicon photoconductive terahertz detector on sapphire substrates at room temperature.The best voltage responsivity of the detector is 6679 V/W at frequency 300 GHz as well as low voltage noise of 3.8 nV/Hz1/2 for noise equivalent power 0.57 pW/Hz1/2.The measured response time of the device is about 9μs,demonstrating that the detector has a speed of>110 kHz.The achieved good performance,together with large detector size(acceptance area is 3μm×160μm),simple structure,easy manufacturing method,compatibility with mature silicon technology,and suitability for large-scale fabrication of imaging arrays provide a promising approach to the development of sensitive terahertz room-temperature detectors.
