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Effect of Cu doping on the secondary electron yield of carbon films on Ag-plated aluminum alloy
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作者 Tiancun Hu Shukai Zhu +11 位作者 Yanan Zhao Xuan Sun Jing Yang Yun He Xinbo Wang chunjiang bai He bai Huan Wei Meng Cao Zhongqiang Hu Ming Liu Wanzhao Cui 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第4期681-685,共5页
Reducing the secondary electron yield(SEY)of Ag-plated aluminum alloy is important for high-power microwave components.In this work,Cu doped carbon films are prepared and the secondary electron emission characteristic... Reducing the secondary electron yield(SEY)of Ag-plated aluminum alloy is important for high-power microwave components.In this work,Cu doped carbon films are prepared and the secondary electron emission characteristics are studied systematically.The secondary electron coefficientδ_(max) of carbon films increases with the Cu contents increasing at first,and then decreases to 1.53 at a high doping ratio of 0.645.From the viewpoint of surface structure,the higher the content of Cu is,the rougher the surface is,since more cluster particles appear on the surface due to the small solid solubility of Cu in the amorphous carbon network.However,from viewpoint of the electronic structure,the reduction of the sp2 hybrid bonds will increase the SEY effect as the content of Cu increases,due to the decreasing probability of collision with free electrons.Thus,the two mechanisms would compete and coexist to affect the SEY characteristics in Cu doped carbon films. 展开更多
关键词 copper-doped carbon secondary electron yield microwave devices surface roughness
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