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Two-photon lithography for integrated photonic packaging 被引量:2
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作者 Shaoliang Yu Qingyang Du +3 位作者 cleber renato mendonca Luigi Ranno Tian Gu Juejun Hu 《Light(Advanced Manufacturing)》 2023年第4期150-166,共17页
Photonic integrated circuits(PICs)have long been considered as disruptive platforms that revolutionize optics.Building on the mature industrial foundry infrastructure for electronic integrated circuit fabrication,the ... Photonic integrated circuits(PICs)have long been considered as disruptive platforms that revolutionize optics.Building on the mature industrial foundry infrastructure for electronic integrated circuit fabrication,the manufacturing of PICs has made remarkable progress.However,the packaging of PICs has often become a major barrier impeding their scalable deployment owing to their tight optical alignment tolerance,and hence,the requirement for specialty packaging instruments.Two-photon lithography(TPL),a laser direct-write three-dimensional(3-D)patterning technique with deep subwavelength resolution,has emerged as a promising solution for integrated photonics packaging.This study provides an overview of the technology,emphasizing the latest advances in TPL-enabled packaging schemes and their prospects for adoption in the mainstream photonic industry. 展开更多
关键词 Photonic packaging Two-photon lithography Photonic wire bonding MICROOPTICS Integrated photonics
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