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A New Method for Thin Film Deposition-Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct-Current Magnetron Sputtering 被引量:4
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作者 XU Jun MA Teng-cai +2 位作者 LU Wen-qi XIA Yuan-liang deng xin-lu 《Chinese Physics Letters》 SCIE CAS CSCD 2000年第8期586-588,共3页
A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CN_(x) films has been prepared by using this system.The character izatio... A new reactive magnetron sputtering system enhanced by the faced microwave electron cyclotron resonance plasma source was designed and amorphous CN_(x) films has been prepared by using this system.The character ization of the films by interference microscopy,atomic force microscopy,and x-ray photoelectron spectroscopy shows that the deposition rate is strongly affected by the direct-current bias,and the films are composed by a single carbon nitride phase and the N/C ratio is 4:3.2,which is close to that of C_(3)N_(4)(4:3). 展开更多
关键词 ELECTRON PLASMA MICROWAVE
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Preparation of TiO_(x)/γ-Al_(2)O_(3) Catalyst on Powdery γ-Al_(2)O_(3) by Using Reactive Sputtering Deposition
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作者 LU Wen-qi XU Zhen-feng +4 位作者 deng xin-lu XU Jun ZHANG Jia-liang ZHU Ai-min GONG Wei-min 《Chinese Physics Letters》 SCIE CAS CSCD 1999年第6期426-427,共2页
A layer of TiO_(x) was deposited on powdery γ-Al_(2)O_(3) by using Sat-target magnetron sputtering in microwave electron cyclotron resonance plasma.A vibrator was developed to coat the γ-Al_(2)O_(3) particles evenly... A layer of TiO_(x) was deposited on powdery γ-Al_(2)O_(3) by using Sat-target magnetron sputtering in microwave electron cyclotron resonance plasma.A vibrator was developed to coat the γ-Al_(2)O_(3) particles evenly by TiO_(x).The conversion efficiency of methane and both the yield and the selectivity of C_(2) hydrocarbons and C_(2)H_(2) were revealed to be superior to that by conventional chemical method.The use of vibrator is effective. 展开更多
关键词 method. (x) evenly
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